Enhanced Si and B diffusion in semiconductor-grade SiO2 and...

Enhanced Si and B diffusion in semiconductor-grade SiO2 and the effect of strain on diffusion

Masashi Uematsu, Hiroyuki Kageshima, Shigeto Fukatsu, Kohei M. Itoh, Kenji Shiraishi, Minoru Otani, Atsushi Oshiyama
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
508
Year:
2006
Language:
english
Pages:
6
DOI:
10.1016/j.tsf.2005.06.118
File:
PDF, 361 KB
english, 2006
Conversion to is in progress
Conversion to is failed