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Formation of microcrystalline silicon and SiNx films by electron-beam-induced-chemical vapor deposition at ultra low temperature
Tetsuya Sato, Minoru Mitsui, Junji Yamanaka, Kiyokazu Nakagawa, Yutaka Aoki, Shouji Sato, Chiharu MiyataVolume:
508
Year:
2006
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2005.07.333
File:
PDF, 211 KB
english, 2006