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Chemical vapor phase etching of polycrystalline selective to epitaxial Si and SiGe
Yuji Yamamoto, Bernd Tillack, Klaus Köpke, Oksana FursenkoVolume:
508
Year:
2006
Language:
english
Pages:
4
DOI:
10.1016/j.tsf.2005.08.390
File:
PDF, 189 KB
english, 2006