Plasma/reactor walls interactions in advanced gate etching processes
R. Ramos, G. Cunge, O. Joubert, N. Sadeghi, M. Mori, L. VallierVolume:
515
Year:
2007
Language:
english
Pages:
7
DOI:
10.1016/j.tsf.2006.10.025
File:
PDF, 611 KB
english, 2007