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Improvement in gate LWR with plasma curing of ArF photoresists
A. Ando, E. Matsui, N.N. Matsuzawa, Y. Yamaguchi, K. Kugimiya, M. Yoshida, K.M.A. Salam, T. Kusakabe, T. TatsumiVolume:
515
Year:
2007
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2006.10.051
File:
PDF, 896 KB
english, 2007