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Formation of silicon carbide at low temperatures by chemical transport of silicon induced by atmospheric pressure H2/CH4 plasma
H. Kakiuchi, H. Ohmi, K. YasutakeVolume:
516
Year:
2008
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2007.11.031
File:
PDF, 491 KB
english, 2008