Volume 516; Issue 19

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Thin Solid Films
Volume 516; Issue 19

Thin Solid Films

Volume 516; Issue 19

1

Preface

M. Hori, Jeon G. Han, M. Sekine, E. Stamate, P. Ventzek, T. Watanabe

Journal:

Thin Solid Films

Year:

2008

Language:

english

File:

PDF, 81 KB

english, 2008

2

Structure and properties of Ti–Si–N films with ∼ 10 at.% Si deposited using reactive magnetron sputtering with high-flux low-energy ion assistance

Z.G. Li, S. Miyake, M. Makino, Y.X. Wu

Journal:

Thin Solid Films

Year:

2008

Language:

english

File:

PDF, 648 KB

english, 2008

3

Integrated diagnostics of magnetron sputtering discharge

N. Britun, J.G. Han

Journal:

Thin Solid Films

Year:

2008

Language:

english

File:

PDF, 529 KB

english, 2008

4

Low temperature synthesis of ITO thin film on polymer in Ar/H2 plasma by pulsed DC magnetron sputtering

Chang S. Moon, Jeon G. Han

Journal:

Thin Solid Films

Year:

2008

Language:

english

File:

PDF, 527 KB

english, 2008

5

Influence of hydrogen atoms on the growth of carbon based nanoparticles and of thin films from reactive plasmas

Olivera Stepanović, Johannes Berndt, Joerg Winter

Journal:

Thin Solid Films

Year:

2008

Language:

english

File:

PDF, 595 KB

english, 2008

6

Hydrogen-storage characteristics of hydrogenated amorphous carbon nitrides

Haruhiko Ito, Taro Nozaki, Akihiko Saikubo, Noriko Yamada, Kazuhiro Kanda, Masahito Niibe, Hidetoshi Saitoh

Journal:

Thin Solid Films

Year:

2008

Language:

english

File:

PDF, 336 KB

english, 2008

7

Formation of silicon carbide at low temperatures by chemical transport of silicon induced by atmospheric pressure H2/CH4 plasma

H. Kakiuchi, H. Ohmi, K. Yasutake

Journal:

Thin Solid Films

Year:

2008

Language:

english

File:

PDF, 491 KB

english, 2008

8

High-density microwave plasma-enhanced chemical vapor deposition of microcrystalline silicon from dichlorosilane

Naoyuki Ohse, Kazu Hamada, Jhantu Kumar Saha, Tomohiro Kobayashi, Yu-ichiro Takemura, Hajime Shirai

Journal:

Thin Solid Films

Year:

2008

Language:

english

File:

PDF, 1.36 MB

english, 2008

9

Surface modification of fluorocarbon polymer films for improved adhesion using atmospheric-pressure nonthermal plasma graft-polymerization

Masaaki Okubo, Mitsuru Tahara, Noboru Saeki, Toshiaki Yamamoto

Journal:

Thin Solid Films

Year:

2008

Language:

english

File:

PDF, 748 KB

english, 2008

10

Physical properties and etching characteristics of metal (Al, Ag, Li) doped ZnO films grown by RF magnetron sputtering

S.H. Jeong, D.-G. Yoo, D.Y. Kim, N.-E. Lee, J.-H. Boo

Journal:

Thin Solid Films

Year:

2008

Language:

english

File:

PDF, 521 KB

english, 2008

11

Phase formation and luminescence properties in Eu3+-doped TiO2 nanoparticles prepared by thermal plasma pyrolysis of aqueous solutions

Masashi Ikeda, Ji-Guang Li, Norio Kobayashi, Yusuke Moriyoshi, Hiromi Hamanaka, Takamasa Ishigaki

Journal:

Thin Solid Films

Year:

2008

Language:

english

File:

PDF, 425 KB

english, 2008

12

A numerical analysis of plasma-particle heat exchange during in-flight treatment of granulated powders by argon-oxygen induction thermal plasmas

M. Mofazzal Hossain, Yaochun Yao, Takayuki Watanabe

Journal:

Thin Solid Films

Year:

2008

Language:

english

File:

PDF, 495 KB

english, 2008

13

Aerodynamic plasma actuators: A directional micro-jet device

Nicolas Bénard, Jérôme Jolibois, Eric Moreau, Roberto Sosa, Guillermo Artana, Gérard Touchard

Journal:

Thin Solid Films

Year:

2008

Language:

english

File:

PDF, 1.23 MB

english, 2008

14

Low temperature growth of polycrystalline Si on polyethylene terephthalate (PET) films using pulsed-plasma CVD under near atmospheric pressure

M. Matsumoto, Y. Inayoshi, M. Suemitsu, T. Yara, S. Nakajima, T. Uehara, Y. Toyoshima

Journal:

Thin Solid Films

Year:

2008

Language:

english

File:

PDF, 468 KB

english, 2008

15

Cu films deposition by dielectric barrier discharge in supercritical CO2, Ar and Xe environments

Hirokazu Kikuchi, Hirotake Kubo, Takaaki Tomai, Kazuo Terashima

Journal:

Thin Solid Films

Year:

2008

Language:

english

File:

PDF, 2.02 MB

english, 2008

16

Self-assembled low-dimensional nanomaterials via low-temperature plasma processing

K. Ostrikov, I. Levchenko, S. Xu, S.Y. Huang, Q.J. Cheng, J.D. Long, M. Xu

Journal:

Thin Solid Films

Year:

2008

Language:

english

File:

PDF, 986 KB

english, 2008

17

Study on reaction field in arc-in-water to produce carbon nano-materials

Noriaki Sano, Osamu Kawanami, Tawatchai Charinpanitkul, Wiwut Tanthapanichakoon

Journal:

Thin Solid Films

Year:

2008

Language:

english

File:

PDF, 796 KB

english, 2008

18

Physicochemistry of the plasma-electrolyte solution interface

Qiang Chen, Kenji Saito, Yu-ichiro Takemura, Hajime Shirai

Journal:

Thin Solid Films

Year:

2008

Language:

english

File:

PDF, 827 KB

english, 2008

19

Effects of feed rate and particle size on the in-flight melting behavior of granulated powders in induction thermal plasmas

Yaochun Yao, M. Mofazzal Hossain, Takayuki Watanabe, Tomoyuki Tsujimura, Fuji Funabiki, Tetsuji Yano

Journal:

Thin Solid Films

Year:

2008

Language:

english

File:

PDF, 1.09 MB

english, 2008

20

Numerical analysis of pressure dependence on carbon nanotube growth in CH4/H2 plasmas

Akinori Oda, Yoshiyuki Suda, Atsushi Okita

Journal:

Thin Solid Films

Year:

2008

Language:

english

File:

PDF, 372 KB

english, 2008

21

Hydrogen isotope sputtering of graphite by molecular dynamics simulation

Atsushi Ito, Hiroaki Nakamura

Journal:

Thin Solid Films

Year:

2008

Language:

english

File:

PDF, 1.46 MB

english, 2008

22

Coatings and microstructures of monolithic TiB2 films and double layer and composite TiCN/TiB2 films from alkoxide solutions by thermal plasma CVD

S. Shimada, M. Takahashi, H. Kiyono, J. Tsujino

Journal:

Thin Solid Films

Year:

2008

Language:

english

File:

PDF, 1.01 MB

english, 2008

23

Vaporization mechanism from Sn–Ag mixture by Ar–H2 Arc for nanoparticle preparation

Manabu Tanaka, Takayuki Watanabe

Journal:

Thin Solid Films

Year:

2008

Language:

english

File:

PDF, 880 KB

english, 2008

24

TiAlN film preparation by Y-shape filtered-arc-deposition system

Takayuki Mashiki, Hiroki Hikosaka, Hideto Tanoue, Hirofumi Takikawa, Yushi Hasegawa, Makoto Taki, Masao Kumagai, Masao Kamiya

Journal:

Thin Solid Films

Year:

2008

Language:

english

File:

PDF, 738 KB

english, 2008

25

Effect of stage control parameters on the FIB milling process

Joon Hyun Kim, Jin-Hyo Boo, Youn-Jea Kim

Journal:

Thin Solid Films

Year:

2008

Language:

english

File:

PDF, 605 KB

english, 2008

26

Estimation of defect generation probability in thin Si surface damaged layer during plasma processing

Koji Eriguchi, Akira Ohno, Daisuke Hamada, Masayuki Kamei, Kouichi Ono

Journal:

Thin Solid Films

Year:

2008

Language:

english

File:

PDF, 335 KB

english, 2008

27

Electron temperature measurement of tungsten inert gas arcs

Manabu Tanaka, Shinichi Tashiro

Journal:

Thin Solid Films

Year:

2008

Language:

english

File:

PDF, 717 KB

english, 2008

28

Magnetized microdischarge plasma generation at low pressure

Tsuyohito Ito, Kazunobu Kobayashi, Satoshi Hamaguchi, Mark A. Cappelli

Journal:

Thin Solid Films

Year:

2008

Language:

english

File:

PDF, 603 KB

english, 2008

29

Fundamental study on quasi-real-time detection of airborne bio-particles using discharge plasma

Masudur Rahman, Masakazu Tanino, Mai Hashimoto, Michihiko Nakano, Hachiro Yasuda, Kazunori Takashima, Akira Mizuno

Journal:

Thin Solid Films

Year:

2008

Language:

english

File:

PDF, 698 KB

english, 2008

30

Plasma-chemical surface functionalization of flexible substrates at atmospheric pressure

Nobuyuki Zettsu, Hiroto Itoh, Kazuya Yamamura

Journal:

Thin Solid Films

Year:

2008

Language:

english

File:

PDF, 630 KB

english, 2008

31

Tribological properties of a-C:H:N thin films prepared using C2H2 and N2 by CFUBM sputtering method

Yong Seob Park, Hyung Jun Cho, Byungyou Hong

Journal:

Thin Solid Films

Year:

2008

Language:

english

File:

PDF, 1.36 MB

english, 2008

32

Continuous operation of commercial-scale plasma–chemical aftertreatment system of smoke tube boiler emission with oxidation reduction potential and pH control

Tomoyuki Kuroki, Hidekatsu Fujishima, Keiichi Otsuka, Tomohiro Ito, Masaaki Okubo, Toshiaki Yamamoto, Keiichiro Yoshida

Journal:

Thin Solid Films

Year:

2008

Language:

english

File:

PDF, 721 KB

english, 2008

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