Difference of deposition process of an amorphous carbon...

Thin Solid Films 2010 Vol. 518; Iss. 13

Difference of deposition process of an amorphous carbon film due to source gases

Masanori Shinohara, Hiroki Kawazoe, Takanori Inayoshi, Taka-aki Kawakami, Yoshinobu Matsuda, Hiroshi Fujiyama, Yuki Nitta, Tatsuyuki Nakatani
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Volume:
518
Year:
2010
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2009.11.033
File:
PDF, 394 KB
english, 2010
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