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Poly-Silicon Etch with Diluted Ammonia: Application to Replacement Gate Integration Scheme
Sebai, Farid, Del Agua Borniquel, Jose Ignacio, Vos, Rita, Absil, Philippe, Chiarella, Thomas, Vrancken, Christa, Boelen, Pieter, Baiya, EvansVolume:
145-146
Year:
2009
Language:
english
Journal:
Solid State Phenomena
DOI:
10.4028/www.scientific.net/SSP.145-146.207
File:
PDF, 349 KB
english, 2009