Characterization of the Interfaces between SiC and Oxide...

Materials Science Forum 2002 Vol. 389-393

Characterization of the Interfaces between SiC and Oxide Films by Spectroscopic Ellipsometry

Tomioka, Yuichi, Iida, T., Midorikawa, M., Tukada, H., Yoshimoto, K., Hijikata, Yasuto, Yaguchi, Hiroyuki, Yoshikawa, Masahito, Ishida, Yuuki, Kosugi, Ryouji, Yoshida, Sadafumi
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
389-393
Year:
2002
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.389-393.1029
File:
PDF, 349 KB
2002
Conversion to is in progress
Conversion to is failed