General Model of Diffusion of Interstitial Oxygen in...

Solid State Phenomena 2005 Vol. 108-109

General Model of Diffusion of Interstitial Oxygen in Silicon, Germanium and Silicon - Germanium Crystals

Gusakov, Vasilii E.
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Volume:
108-109
Year:
2005
Language:
english
Journal:
Solid State Phenomena
DOI:
10.4028/www.scientific.net/SSP.108-109.413
File:
PDF, 321 KB
english, 2005
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