Etch Pits on 4H-SiC Surface Produced by ClF3 Gas

Materials Science Forum 2011 / 3 Vol. 679-680

Etch Pits on 4H-SiC Surface Produced by ClF3 Gas

Habuka, Hitoshi, Furukawa, Kazuchika, Tanaka, Keiko, Katsumi, Yusuke, Iizuka, Shinji, Fukae, Katsuya, Kato, Tomohisa
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Volume:
679-680
Language:
english
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.679-680.286
Date:
March, 2011
File:
PDF, 511 KB
english, 2011
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