![](/img/cover-not-exists.png)
Retardation Phenomenon of Oxide Removal during the Formation of Dual Gate Oxide via PR-Mask Wet Etching
Ko, Ki Hyung, Song, Myung Geun, Cho, Byung Kwon, Yoon, Bo Un, Cho, Yu Jin, Kim, Tae SungVolume:
219
Language:
english
Journal:
Solid State Phenomena
DOI:
10.4028/www.scientific.net/SSP.219.24
Date:
September, 2014
File:
PDF, 763 KB
english, 2014