Volume 219

Solid State Phenomena

Volume 219

1

Necessity of Cleaning and its Application in Future Memory Devices

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 1.47 MB

english, 2014

2

Freeze Drying of High Aspect Ratio Structures

Patel, Mehul N., Sirard, Steve, Limary, Ratchana, Hymes, Diane

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 464 KB

english, 2014

3

Improvement of Silicon Solar Cell Substrates by Wet-Chemical Oxidation Studied by Surface Photovoltage Measurements

Angermann, Heike, Laades, Abdelazize, Kegel, Jan, Klimm, Carola, Stegemann, Bert

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 2.74 MB

english, 2014

4

Investigation of Silicon Saw Damage Removal and Surface Texturing Using KOH for next Generation Silicon Solar Cells

Haslinger, Michael, Rip, Jens, Robert, Sofie, Claes, Martine, Duerinckx, Filip, Debucquoy, Maarten, Mertens, Paul W., John, Joachim, Pysch, Damian, Queisser, Steffen, Schweckendiek, Juergen, Hajjiad,

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 2.05 MB

english, 2014

5

Novel Slurry Injection System for Improved Slurry Flow and Reduced Defects in CMP

Philipossian, Ara, Borucki, Len, Sampurno, Yasa, Zhuang, Yun

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 349 KB

english, 2014

6

Collection Efficiency of Noble Metallic Contaminants on Si Wafers with HF-Aqua Regia Mixtures for VPD-DC ICPMS Analysis

Devita, M., Fontaine, H., Drogue, N., Mathiot, D., Enyedi, V., Lardin, T.

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 373 KB

english, 2014

7

Effect of Nozzle Distance and Fluid Flow Rate in Jet Spray Wafer Cleaning Process

Seo, Kwang Min, Kim, Dae Heon, Cho, Yu Jin, Kim, Tae Sung

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 278 KB

english, 2014

8

Cost-of-Ownership Comparison of Single-Wafer Processes for Stripping Copper Pillar Bump Photomasks

Sohn, Hong Seong, Hua, Tan Kuam, Liang, Ding, Jang, Steven Lee Hou, Leng, Loh Woon, Lin, Hua Mao, Tracy, John

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 1.57 MB

english, 2014

9

Surface Cleaning and Passivation of Chalcogenide Thin Films Using S(NH4)2 Chemical Treatment

Buffiere, Marie, El Mel, Abdel Aziz, Lenaers, Nick, Brammertz, Guy, Zaghi, Armin E., Meuris, Marc, Poortmans, Jef

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 258 KB

english, 2014

10

Cross-Contamination Risk Evaluation during Fabrication of III-V Devices in a Silicon Processing Environment

Roure, Marie Christine, Vialle, Sylvain, Rebaud, Mickaël, Fontaine, Hervé, Besson, Pascal

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 544 KB

english, 2014

11

Aluminum Reduction in SC1

Kweskin, Sasha J., Shive, Larry W.

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 279 KB

english, 2014

12

Rapid Determination of Organic Contaminations on Wafer Surfaces

Meyer, Sylke, Timmel, Sebastian, Hagendorf, Christian

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 622 KB

english, 2014

13

Megasonic Enhanced Photoresist Strip with DiO3

Dussault, Don, Fittkau, Jens, Gottschalk, Christiane

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 559 KB

english, 2014

14

Operation of a New Electrolyzed Cell Using Boron Doped Diamond Electrodes

Fryda, M., Mathée, Th., Oshinowo, J., Baek, D.H., Förster, H. J., Heinze, G.

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 982 KB

english, 2014

15

Metal Etch in Advanced Immersion Tank with Precision Uniformity Using Agitation and Wafer Rotation

Tice, Scott, Park, Chan Geun

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 1.57 MB

english, 2014

16

Effect of Dissolved Oxygen for Advanced Wet Processing

Yoshida, Yukifumi, Otsuji, Masayuki, Takahashi, Hiroaki, Snow, Jim, Sebaai, Farid, Holsteyns, Frank, Mertens, Paul W., Sato, Masanobu, Shirakawa, Hajime, Uchida, Hirofumi

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 448 KB

english, 2014

17

Upside-Down Residual Sessile Droplet: Watermarks on Wafers Backside

Belmiloud, N., Schaffert, E., Steininger, R., Okamoto, K., Grothe, M., Koerner, G.

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 953 KB

english, 2014

18

Adhesion Improvement through Plasma Surface Treatments on Palladium Surface

Venegoni, Ivan, Consonni, Matteo, Bianchi, Irene, Ravizza, Enrica, Grasso, Salvatore, Spadoni, Simona, Pistoni, Mario, Colpani, Paolo

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 1.85 MB

english, 2014

19

Focus Spot Reduction by Brush Scrubber Cleaning

Pacco, Antoine, Kesters, Els, Simms, Ihsan, Nafus, Kathleen, Vandereyken, Jelle, Yonekawa, Hiroki

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 538 KB

english, 2014

20

Passivation of InSb(100) with 1-Eicosanethiol Self-Assembled Monolayers

Contreras, Yissel, Muscat, Anthony J.

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 552 KB

english, 2014

21

Characterization of Cu-BTA Organic Complexes on Cu during Cu CMP and Post Cu Cleaning

Cho, Byoung Jun, Park, Jin Goo, Shima, Shohei, Hamada, Satomi

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 713 KB

english, 2014

22

InGaAs (110) Surface Cleaning Using Atomic Hydrogen

Kent, Tyler, Edmonds, Mary, Droopad, Ravi, Kummel, Andrew C.

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 1.09 MB

english, 2014

23

Nanoscale Etching and Reoxidation of InAs

van Dorp, Dennis H., Arnauts, S., Cuypers, D., Rip, J., Holsteyns, F., De Gendt, S.

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 481 KB

english, 2014

24

Effects of Chamber Pressure on the Performance of CO2 Beam Cleaning

Kim, Seung Ho, Lee, Joong Ha, Kim, Ho Young

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 734 KB

english, 2014

25

Understanding the Formation of Circular Ring Defects in Post-CMP Cleaning

Hsu, Ping, Luo, Roger, Berar, Pascal

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 887 KB

english, 2014

26

Ozone Base Cleaning: Impact on High Efficiency Interdigitated Back Contact Solar Cells

O’Sullivan, B.J., Haslinger, M., Singh, S., Bearda, T., Debucquoy, Maarten, Szlufcik, J.

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 339 KB

english, 2014

27

Retardation Phenomenon of Oxide Removal during the Formation of Dual Gate Oxide via PR-Mask Wet Etching

Ko, Ki Hyung, Song, Myung Geun, Cho, Byung Kwon, Yoon, Bo Un, Cho, Yu Jin, Kim, Tae Sung

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 763 KB

english, 2014

28

Effect of Viscoelasticity of PVA Brush on Friction during Post-CMP Cleaning: A Guideline for Nodule Configuration

Hara, Y., Sanada, T., Fukunaga, A., Hiyama, H.

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 786 KB

english, 2014

29

Catalyst Assisted Low Temperature Pre Epitaxial Cleaning for Si and SiGe Surfaces

Dhayalan, Sathish Kumar, Hikavyy, Andriy, Loo, Roger, Wostyn, Kurt, Kenis, Karine, Shimura, Yosuke, Rosseel, Erik, Profijt, Harald B., Maes, Jan Willem, Douhard, Bastien, Vandervorst, Wilfried

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 778 KB

english, 2014

30

Process Control Challenges of Wet Etching Large MEMS Si Cavities

Kashkoush, Ismail, Rieker, Jennifer, Chen, Gim, Nemeth, Dennis

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 1.94 MB

english, 2014

31

Removal of Interfacial Layer in HfO2 Gate Stack by Post-Gate Cleaning Using NF3/NH3 Dry Cleaning Technique

Lee, Min Seon, Oh, Hoon Jung, Lee, Joo Hee, Lee, In Geun, Shin, Woo Gon, Kang, Sung Yong, Ko, Dae Hong

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 495 KB

english, 2014

32

Effect of DI-Water Dilution and Etchant Arm Movement on Spinning Type Wet Etch

Lee, Hui Hwan, Ahn, Duk Min, Lim, Seung Taek, Kim, Tae Sung

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 243 KB

english, 2014

33

Impact of Electrostatic Effects on Wet Etching Phenomenon in Nanoscale Region

Okuyama, Atsushi, Saito, Suguru, Hagimoto, Yoshiya, Nishi, Kenji, Suzuki, Ayuta, Toshima, Takayuki, Iwamoto, Hayato

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 746 KB

english, 2014

34

Characterization of Cavitation in Ultrasonic or Megasonic Irradiated Gas Saturated Solutions Using a Hydrophone

Zhao, M., Balachandran, R., Madigappu, P.R., Yam, P., Zanelli, C., Sierra, R., Keswani, M.

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 1.13 MB

english, 2014

35

Correlation of Cleaning Conditions and Wafer Out-Gassing

Han, Sok Hyung, Hwang, Tae Ho, Kim, Si Chul, Park, Seung Ha, Ryu, Byung Sul

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 396 KB

english, 2014

36

The Role of Mass Transfer in Removal of Cross-Linked Sacrificial Layers in 3DI Applications

Sobhian, Mani, Goodman, Daniel L., Rabideau, Dustin, Keigler, Arthur

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 648 KB

english, 2014

37

Quantitative Analysis of Transition Metals Penetrating Silicon Substrate through SiN Film by Dopant Ion Implantation and Annealing

Saga, Koichiro, Kobayashi, Shunsuke, Sueoka, Koji

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 482 KB

english, 2014

38

Nuclear Magnetic Resonance Spectroscopy of Trace Organic Impurities Extracted from a Corrosion Inhibitor and a Semiaqueous Residue Remover

Westwood, Glenn

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 421 KB

english, 2014

39

Study of Etchants’ Diffusion into a 248 nm Deep UV Photoresist during a Wet Etch

Foucaud, Mathieu, Rochat, Névine, Garnier, Philippe, Pargon, Erwine, Tiron, Raluca

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 423 KB

english, 2014

40

Wetting Behavior of Plasma Etch Residue Removal Solutions on Plasma Damaged and Repaired Porous ULK Dielectrics

Ahner, Nicole, Zimmermann, Sven, Köhler, Nicole, Krüger, Stephan, Schulz, Stefan E.

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 258 KB

english, 2014

41

Post Etch Residue Removal and Material Compatibility in BEOL Using Formulated Chemistries

Kesters, Els, Le, Q.T., Yu, D., Shen, M., Braun, S., Klipp, A., Holsteyns, F.

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 780 KB

english, 2014

42

Backside and Bevel Contamination Removal

Besson, Pascal, Roure, Marie Christine, Kachtouli, Riadh, Jourdan, Marine, Gabette, Laurence, Royer, Agnes, Loup, Virginie

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 234 KB

english, 2014

43

Industrial Challenges of TiN Hard Mask Wet Removal Process for 14nm Technology Node

Iwasaki, Akihisa, Courouble, Kristell, Lippy, Steven, Buisine, Fabrice, Ishikawa, Hidekazu, Cooper, Emanuel, Kennedy, Evelyn, Zoll, Stephane, Broussous, Lucile

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 1.82 MB

english, 2014

44

Nickel Selective Etch for Contacts on Ge Based Devices

Sebaai, Farid, Witters, Liesbeth, Holsteyns, Frank, Yukifumi, Yoshida, Mertens, Paul W., De Gendt, Stefan

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 342 KB

english, 2014

45

Physical Chemistry of Water Droplets in Wafer Cleaning with Low Water Use

van der Donck, Jacques C.J., Bakker, Jurrian, Smeltink, Jeroen A., Kolderweij, Robin B.J., van der Zon, Ben C.M.B., van Kleef, Marc H.

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 743 KB

english, 2014

46

Fluid Flow and Defect Density Considerations when Drying Bumped Wafers Using Spin and Surface Tension Gradient Methods

Goodman, Daniel L., Rabideau, Dustin, Sobhian, Mani

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 542 KB

english, 2014

47

Detection of HO2•/O2•- Radicals Formed in Aqueous Solutions Irradiated with Megasonic Waves Using a Cavitation Threshold (CT) Cell Set-Up

Han, Zhen Xing, Wu, Bing, Brown, Ian, Beck, Mark, Raghavan, Srini

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 1.04 MB

english, 2014

48

Effect of Downstream Plasma Treatment on Dissolution of Fluorocarbon Polymer in Organic Solvents

Le, Quoc Toan, Kesters, E., Devonport, J., Holsteyns, F., De Gendt, S.

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 426 KB

english, 2014

49

Simplified Cleaning for a-Si:H Passivation of Wafers Bonded to Glass

Granata, Stefano Nicola, Bearda, T., Gordon, I., Abdulraheem, Y., Mertens, R., Poortmans, J.

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 275 KB

english, 2014

50

Advanced Monitoring of TMAH Solution

Wang, Jing Jing, Shalyt, Eugene, Bai, Chuan Nan, Liang, Guang, MacEwan, Michael, Parekh, Vishal

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 385 KB

english, 2014

51

Scaling the 3D Bumps Pitch from 20 to 10 μm, Focusing on the Wet Cu Seed Etch Process Development

Suhard, Samuel, Moussa, A., Slakkeboorn, J., Beirnaert, F., de Preter, I., Holsteyns, F.

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 2.05 MB

english, 2014

52

Surface Cleaning of Graphene by CO2 Cluster

Choi, Hoo Mi, Kim, Jang Ah, Cho, Yu Jin, Hwang, Taeh Yun, Lee, Jon Woo, Kim, Tae Sung

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 608 KB

english, 2014

53

TiN Hard Mask Cleans with SC1 Solutions, for 64nm Pitch BEOL Patterning

Broussous, Lucile, Krejcirova, D., Courouble, K., Zoll, S., Iwasaki, A., Ishikawa, H., Buisine, F., Lamaury, A., Fuard, D.

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 588 KB

english, 2014

54

Pt Etching Method at Low Temperature Using Electrolyzed Sulfuric Acid Solution

Ogawa, Yuichi, Uchida, Minoru, Otsu, Toru, Nagai, Tatsuo, Morita, Hiroshi

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 408 KB

english, 2014

55

Photo Lithography - Surface Preparation Interactions

Garnier, Philippe

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 1.40 MB

english, 2014

56

Prevention of Unexpected Oxidation of Metal Layer by Removing Hydrogen Peroxide from Ultrapure Water and Diluted Hydrofluoric Acid

Yaon, Daisaku, Murayama, Masami, Kobayashi, Hikaru, Yamanaka, Koji

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 1.04 MB

english, 2014

57

Metal Removal Efficiency in Deep Submicron Trenches by Wet Chemicals

Garnier, Philippe, Drogue, Nathalie, Duru, Romain

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 1.23 MB

english, 2014

58

Watermark Formation on Bare Silicon: Impact of Illumination and Substrate Doping

Tamaddon, Amir Hossein, Philipsen, Harold, Mertens, Paul W., Holsteyns, Frank, Heyns, Marc, De Gendt, Stefan, van Dorp, Dennis H.

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 542 KB

english, 2014

59

Selective Nitride Etching with Phosphoric and Sulfuric Acid Mixtures Using a Single-Wafer Wet Processor

Sih, Vincent, Reimer, Berthold, Ratkovich, Anthony S., Lauerhaas, Jeffrey M., Butterbaugh, Jeffery W.

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 1.92 MB

english, 2014

60

Single Wafer Selective Silicon Nitride Removal with Phosphoric Acid and Steam

Guo, Ted, Yu, Wesley, Chien, C.C., Lin, Euing, Yang, N.H., Lin, J.F., Wu, J.Y., Ratkovich, Anthony, Kahaian, Don, Butterbaugh, Jeffery W., Lauerhaas, Jeffrey M.

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 508 KB

english, 2014

61

Particle Measurement with a Liquid-Borne Particle Counter: Analytical Figures of Merit

Liu, Shi, Liu, Bin

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 357 KB

english, 2014

62

Effect of FOUP Atmosphere Control on Process Wafer Integrity in Sub20 nm Device Fabrication

Kim, Bong Ho, Park, Jin Goo

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 493 KB

english, 2014

63

Impact of Fe and Cu Surface Contamination on High Efficiency Solar Cell Processes

Buchholz, Florian, Wefringhaus, Eckard

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 796 KB

english, 2014

64

Surface Chemistry of GaAs(100) and InAs(100) Etching with Tartaric Acid

Mancheno-Posso, Pablo, Muscat, Anthony J.

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 454 KB

english, 2014

65

Wet Etch Rate Behavior of Poly-Si in TMAH Solution at Various Ambient Gas Conditions

Lin, Euing, Guo, Ted, Chien, C.C., Chang, M.H., Yu, Wesley, Yang, N.H., Lin, J.F., Wu, J.Y., Robb, Kenneth M., Baldaro, Alessandro, Other, A.N.

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 547 KB

english, 2014

66

Study of Wetting of Nanostructures Using Decoration by Etching

Vereecke, Guy, Xu, Xiu Mei, Kesters, Els, Simms, Ishan, Nafus, Kathleen, Haensel, Leander, Kim, Tae Gon, Lismont, Mark, Holsteyns, Frank, De Gendt, Stefan

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 969 KB

english, 2014

67

HF-Last Wet Clean in Combination with a Low Temperature GeH4-Assisted HCl In Situ Clean Prior to Si0.8Ge0.2-on-Si Epitaxial Growth

Wostyn, Kurt, Dhayalan, Sathish K., Hikavyy, Andriy, Loo, Roger, Douhard, Bastien, Moussa, Alain, Rondas, Dirk, Kenis, Karine, Mertens, Paul W., Holsteyns, Frank, De Gendt, Stefan, Profijt, Harald B.

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 492 KB

english, 2014

68

TiN Metal Hardmask Residue Removal Formulation Development for Advanced Porous Low-K and Cu Interconnect Application

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 433 KB

english, 2014

69

FOUP Material Influence on HF Contamination during Queue-Time

Bounouar, Julien, Nguyen, Thi Quynh, Le-Barillec, Olivier, Favre, Arnaud, Veran, Emmanuelle, Stassen, Ingo, Gettel, Astrid

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 957 KB

english, 2014

70

Impact of Surface Treatment of Si3N4 on Subsequent SiO2 Deposition

Milanesi, Francesca, Vendrame, Silvio, Ravizza, Enrica, Spadoni, Simona, Pipia, Francesco, Livellara, Luisito

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 1.40 MB

english, 2014

71

Control of HF Volatile Contamination in FOUP Environment by Advanced Polymers and Clean Gas Purge

González-Aguirre, Paola, Fontaine, Hervé, Beitia, Carlos, Ohlsen, Jim, Lundgren, Jorgen

Journal:

Solid State Phenomena

Year:

2014

Language:

english

File:

PDF, 1.23 MB

english, 2014

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