Quantitative Analysis of Transition Metals Penetrating Silicon Substrate through SiN Film by Dopant Ion Implantation and Annealing
Saga, Koichiro, Kobayashi, Shunsuke, Sueoka, KojiVolume:
219
Language:
english
Journal:
Solid State Phenomena
DOI:
10.4028/www.scientific.net/SSP.219.265
Date:
September, 2014
File:
PDF, 482 KB
english, 2014