Post Etch Residue Removal and Material Compatibility in...

Solid State Phenomena 2014 / 9 Vol. 219

Post Etch Residue Removal and Material Compatibility in BEOL Using Formulated Chemistries

Kesters, Els, Le, Q.T., Yu, D., Shen, M., Braun, S., Klipp, A., Holsteyns, F.
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Volume:
219
Language:
english
Journal:
Solid State Phenomena
DOI:
10.4028/www.scientific.net/SSP.219.201
Date:
September, 2014
File:
PDF, 780 KB
english, 2014
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