Accelerated Removal of Photoresist for Semiconductor Production by an Increased-Pressure Ozone and Water Vapor Process
Gale, Glenn W., Toshima, Takayuki, Shindo, Naoki, Iino, Tadashi, Kitahara, Shigenori, Taguchi, KejiVolume:
92
Year:
2003
Journal:
Solid State Phenomena
DOI:
10.4028/www.scientific.net/SSP.92.227
File:
PDF, 321 KB
2003