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Volume 92
Main
Solid State Phenomena
Volume 92
Solid State Phenomena
Volume 92
1
Behaviour of High-k Dielectric Materials with Classical Cleaning Chemistries
Bellandi, Enrico
,
Crivelli, Barbara
,
Alessandri, Mauro
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 280 KB
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2003
2
Formation of Time-Dependent Haze on Silicon Wafers
Münter, N.
,
Kolbesen, Bernd O.
,
Storm, W.
,
Müller, Timo
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 345 KB
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2003
3
Ammonium Nitrate Cleaning Process for Post Metal Photo-Resister Removing
Lo, Chin-Hsin
,
Chen, Fei Yuan
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 231 KB
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2003
4
Influences of Cleaning Conditions and Elapse after Etch on Via Resistance in Multi-Level Cu Interconnects
Hong, Uk Sun
,
Hah, Sang Rok
,
Park, Byung Lyul
,
Park, Chan Geun
,
Oh, Jun Hwan
,
Son, Hong Seong
,
Barnes, Jeff
,
Chung, Ju Hyuk
,
Park, Kwang Myeon
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 355 KB
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2003
5
Selective Wet Etching of High-k Gate Dielectrics
Christenson, Kurt K.
,
Schwab, Brent
,
Wagener, Thomas J.
,
Rosengren, Bruce
,
Riley, Deborah J.
,
Barnett, Joel
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 262 KB
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2003
6
Cleaning of Si Surfaces by Lamp Illumination
Danel, Adrien
,
Tsai, Chia Liang
,
Shanmugasundaram, K.
,
Kamieniecki, E.
,
Tardif, F.
,
Ruzyllo, J.
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 312 KB
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2003
7
Investigation of Particle Removal from Silicon Surfaces by Means of Dry and Steam Laser Cleaning
Leiderer, P.
,
Mosbacher, M.
,
Boneberg, J.
,
Bartels, C.
,
Lang, F.
,
Afonso, Conrado R.M.
,
Baeuerle, D.
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 227 KB
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2003
8
'Resist / Wet Etch' Couple for Dual Gate Oxide
Beverina, Alessio
,
Guilmeau, I.
,
Carrere, J.P.
,
Emonet, N.
,
Guyader, F.
,
Huard, V.
,
Petitdidier, Sébastien
,
Velard, R.
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 291 KB
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2003
9
Effect of Transient pH on Particle Deposition during Immersion Rinsing
Fyen, Wim
,
Xu, Kai Dong
,
Vos, Rita
,
Vereecke, Guy
,
Mertens, Paul W.
,
Heyns, Marc M.
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 343 KB
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2003
10
Compatibility of Supercritical Co2-Based Stripping with Porous Ultra Low-k Materials and Copper
Millet, C.
,
Danel, Adrien
,
Ndour, M.
,
Tardif, F.
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 325 KB
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2003
11
Evaluation of Ultratrace Metallic Elements in Poly-SiGe Thin Films
Yamada, Yuji
,
Kozuka, Shoji
,
Shimazaki, Ayako
,
Takenaka, Miyuki
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 296 KB
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2003
12
Supercritical Carbon Dioxide Processing of Porous Methylsilsesquioxane(PMSQ) Low-k Dielectric Films
Martinez, Hunter John
,
Jacobs, Thieu
,
Wolf, Josh
,
Rothman, Laura
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 447 KB
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2003
13
Novel Photoresist Removal Using Atomic Hydrogen Generated by Heated Catalyzer
Miki, T.
,
Izumi, Akira
,
Matsumura, H.
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 275 KB
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2003
14
Modelling the Growth of Chemical Oxide for Advanced Surface Preparation
Petitdidier, Sébastien
,
Rochat, Névine
,
Rouchon, R.
,
Besson, Pascal
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 321 KB
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2003
15
Forced Vapour-Phase Decomposition (FVPD) in Combination with e.g. TXRF - a Method to Determine Contamination in Silicon
Rink, Ingrid
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 379 KB
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2003
16
Can we Increase the Effiency of Organic Contamination Removal by Ozone/DI-Water Processes by Using Additives?
De Smedt, F.
,
Vankerckhoven, H.
,
De Gendt, Stefan
,
Heyns, Marc M.
,
Vinckier, Chris
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 276 KB
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2003
17
Post-Etch Cleaning Chemistries Evaluation for Low k-Copper Integration
Broussous, Lucile
,
Hinsinger, O.
,
Favier, Sylvie
,
Besson, Pascal
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 428 KB
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2003
18
Stability and Residue Studies of Complexing Agents in SC-1 Bath
Saloniemi, Heini
,
Eränen, Simo
,
Ketola, Raimo A.
,
Kokkonen, Juha
,
Lehto, Sari
,
Luomanperä, Kaija
,
Vastamäki, Pertti
,
Sirén, Heli
,
Anttila, Olli
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 294 KB
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2003
19
Defectivity Study of Cu Metallization Process by Dark- and Bright-Field Inspection
Carbonell, Laureen
,
Holsteyns, Frank
,
Tőkei, Zsolt
,
O'Reilly, Lisa
,
Maex, Karen
,
Mertens, Paul W.
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 367 KB
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2003
20
Metallic Impurity Contamination from Tungsten Gate Cleaning
Choi, Geun Min
,
Ohmi, Tadahiro
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 358 KB
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2003
21
Ozone-Gas Concentration Measurements for Photoresist Stripping
Knotter, D. Martin
,
Marsman, Miranda
,
Meeusen, Patrick
,
Gogg, Georg
,
Nelson, Steve
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 303 KB
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2003
22
Supercritical Carbon Dioxide Cleaning of Low-k Material
Asai, Gary
,
Muraoka, Y.
,
Saito, K.
,
Mizobata, I.
,
Iwata, T.
,
Masuda, K.
,
Iijima, K.
,
Yoshikawa, T.
,
Peters, D.
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 227 KB
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2003
23
Effect of Preparation-Induced Surface Morphology on the Stability of H-Terminated Si(111) and Si(100) Surfaces
Angermann, H.
,
Henrion, W.
,
Rebien, M.
,
Röseler, A.
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 355 KB
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2003
24
A Comprehensive Model for Cleaning Semiconductor Wafers
Burdick, Gretchen
,
Eichenlaub, Sean
,
Berman, Neil
,
Beaudoin, Stephen
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 290 KB
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2003
25
Defect-Free Si Thinning by In Situ HCI Vapour Etching
Loo, R.
,
Caymax, Matty
,
Richard, Olivier
,
Verheyen, Peter
,
Collaert, Nadine
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 361 KB
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2003
26
A Novel Instrumentation for Contamination and Deposition Control on 300 mm Silicon Wafers Employing Synchrotron Radiation Based TXRF and EDXRF Analysis
Beckhoff, Burkhard
,
Fliegauf, R.
,
Weser, J.
,
Ulm, Gerhard
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 425 KB
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2003
27
Alternative Post-Etch Polymer Removal in a Single-Wafer Platform
Dundas, Curt
,
Vroom, René
,
Ghekiere, John
,
Van Doorne, Patrick
,
Rink, Ingrid
,
Sharp, Ian
,
Heffernan, Seamus
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 319 KB
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2003
28
Procedure to Evaluate Particle-Substrate Interaction during Immersion in Liquid
Fyen, Wim
,
Vansteenbergen, J.
,
Xu, Kai Dong
,
Vos, Rita
,
Mertens, Paul W.
,
Heyns, Marc M.
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 330 KB
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2003
29
High Uniformity Wet Processing for Qxide Thinning and Polymer Cleaning Applications
Wagner, Gerald
,
Kinoshita, Kei
,
Sellmer, Reinhard
,
Fichtl, Stefan
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 240 KB
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2003
30
Influence of Hardware and Chemistry on the Removal of Nano-Particles in a Megasonic Cleaning Tank
Vereecke, Guy
,
Vos, Rita
,
Heyns, Marc M.
,
Schmidt, M.
,
Holsteyns, Frank
,
Baeyens, M.
,
Gomme, S.
,
Snow, James
,
Mertens, Paul W.
,
Coenen, V.
,
Bauer, T.
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 408 KB
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2003
31
Relation between Particle Density and Haze on a Wafer: a New Approach to Measuring Nano-Sized Particles
Xu, Kai Dong
,
Vos, Rita
,
Vereecke, Guy
,
Lux, Marcel
,
Fyen, Wim
,
Holsteyns, Frank
,
Kenis, Karine
,
Mertens, Paul W.
,
Heyns, Marc M.
,
Vinckier, Chris
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 372 KB
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2003
32
Post Metal Etch Polymer Removal: A New CF4-Based Dry Plasma Process Sequence
Pozzoli, Maria Paola
,
Petroni, Simona
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 310 KB
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2003
33
Single Wafer Immersion Process Incorporating a Novel Megasonics Configuration with an Advanced IPA Vapor Condensation Dry
Rosato, J.J.
,
Baiya, E.G.
,
Imonigie, J.A.
,
Yalamanchili, M.R.
,
Hansen, E.
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 357 KB
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2003
34
Backside Cleaning for Copper Removal
Richard, Claire Therese
,
Guyader, F.
,
Barla, Kathy
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 343 KB
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2003
35
Introduction of High-k Materials into Wet Processing, Analysis and Behavior
Onsia, Bart
,
Hellin, David
,
Claes, M.
,
Maes, A.
,
De Gendt, Stefan
,
Heyns, Marc M.
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 323 KB
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2003
36
New Contact Cleaning in HF & N2/H2 Microwave Plasma
Kim, Y.B.
,
Kim, Jeong Ho
,
Lee, Yong Mann
,
Lee, Gil Gwang
,
Kim, Jung Yup
,
Ku, Ja Chun
,
Ryu, Jae Ok
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 339 KB
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2003
37
Organic Contamination: Purge Gas Impact in Plastic Storage Boxes
Veillerot, Marc
,
Danel, Adrien
,
Marthon, S.
,
Tardif, F.
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 263 KB
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2003
38
Evaluation of Organic Contamination on Si Wafers in Fab Environments
Jeon, Joong S.
,
Wong, Colman
,
Ohsiek, Susanne
,
Kim, Hyeon S.
,
Ogle, Bob
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 289 KB
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2003
39
Surfactant Selection for AM Clean in a Single Wafer Oasis Wet System
Baker, Jennifer
,
Beaudry, Christopher
,
Morinaga, Hitoshi
,
Verhaverbeke, Steven
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 277 KB
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2003
40
Investigating Post CMP Cleaning Processes for STI Ceria Slurries
Small, Robert
,
Berar, Pascal
,
Scott, Brandon
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 344 KB
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2003
41
A Theoretical and Experimental Study of Damage-Free BEOL Cleaning with Megasonic Agitation
Lauerhaas, Jeffrey M.
,
Wu, Yi
,
Bran, Mario
,
Fraser, Brian
,
Brause, Eric
,
Nicolosi, Tom
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 471 KB
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2003
42
Wet Oxide Etching of Dual Gate Oxide for 0.13μm Technologies and Beyond: Interaction with Photoresist and Equipment
Chooi, Simon Y.M.
,
Loong, Sang-Yee
,
Lim, Christopher
,
Ismail, Zainab
,
Tjoa, Tjin-Tjin
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 419 KB
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2003
43
Future Challenges for Cleaning in Advanced Microelectronics
Bowling, Allen
,
Kirkpatrick, Brian K.
,
Hurd, Trace
,
Losey, Laura
,
Matz, Phil
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 497 KB
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2003
44
Removal of Small (
Eitoku, Atsuro
,
Vos, Rita
,
Snow, James
,
Sato, M.
,
Hirae, S.
,
Nakajima, Kazuo
,
Nonomura, M.
,
Imai, M.
,
Mertens, Paul W.
,
Heyns, Marc M.
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 353 KB
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2003
45
Advanced Cylindrical Capacitor Formation Using Gas-Phase Selective Etching
Hanestad, Ron
,
Schwab, Brent
,
Butterbaugh, Jeffery W.
,
Lee, Kun Tack
,
Shim, Woo Gwan
,
Kim, Sang Yong
,
Han, Yong Pil
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 321 KB
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2003
46
TXRF Analysis of Low Z Elements and TXRF-NEXAFS Speciation of Organic Contaminants on Silicon Wafer Surfaces Excited by Monochromatized Undulator Radiation
Beckhoff, Burkhard
,
Fliegauf, R.
,
Ulm, Gerhard
,
Weser, J.
,
Pepponi, G.
,
Streli, C.
,
Wobrauschek, P.
,
Ehmann, T.
,
Fabry, L.
,
Pahlke, S.
,
Kanngießer, B.
,
Malzer, W.
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 358 KB
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2003
47
Wafer Surface Preparation Requirements for Next-Generation Devices
Kashkoush, Ismail
,
Chen, G.
,
Novak, R.
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 301 KB
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2003
48
Thermal Evolution of (100) Silicon and Chemical Oxides as Seen by ATR Spectroscopy
Tardif, F.
,
Chabli, A.
,
Danel, Adrien
,
Rochat, Névine
,
Veillerot, Marc
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 300 KB
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2003
49
New Dry Tool after Cleaning of Low-k Dielectrics
Okuda, Seiichiro
,
Sugimoto, Hiroaki
,
Hashizume, Akio
,
Tsujikawa, Hiroki
,
Imai, Masayoshi
,
Asai, Gary
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 347 KB
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2003
50
Resist Strip and Cu Diffusion Barrier Etch in Cu BEOL Integration Schemes in a Mattson HighlandsTM Chamber
Mannaert, G.
,
Van Cauwenberghe, Marc
,
Schmidt, M.
,
Van Aelst, Jan
,
Hendrickx, D.
,
Stucchi, M.
,
Conard, Thierry
,
Vanhaelemeersch, Serge
,
Boullart, Werner
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 341 KB
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2003
51
Tribological Characterization of Post-CMP Brush Scrubbbing
Philipossian, Ara
,
Mustapha, Lateef
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 431 KB
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2003
52
Gas-Phase HF/Vapor Etching of Thermal Silicon Dioxide Films
Montaño-Miranda, Gerardo
,
Muscat, Anthony
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 332 KB
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2003
53
New Residue Removal Method Using Ozonated Water with Phosphoric Acid
Oya, Izumi
,
Miyamoto, Makoto
,
Kuzumoto, Masaki
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 231 KB
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2003
54
On-Tool Real-Time Moisture Monitoring Provides Yield and Productivity Benefits
Davis, R.P.
,
Grant, R.B.
,
Papens, L.
,
Stouten, N.
,
Van Hoeymissen, Jan
,
Heyns, Marc M.
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 390 KB
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2003
55
Influence of Frequency on the Removal Efficiency of Nano-Particles in a Megasonic Spray Cleaning Tool
Schmidt, M.
,
Vereecke, Guy
,
Vos, Rita
,
Holsteyns, Frank
,
Baeyens, M.
,
Mertens, Paul W.
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 352 KB
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2003
56
Corrosion Inhibaitors for Copper in Hydroxylamine-Based Chemistries Used for CMP and Post-CMP Cleaning
Tamilmani, Subramanian
,
Huang, Wayne
,
Raghavan, Srini
,
Small, Robert
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 341 KB
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2003
57
Effect of Additives on the Removal Efficiency of Photoresist by Ozone/DI-Water Processes: Experimental Study
Vankerckhoven, H.
,
De Smedt, F.
,
Claes, M.
,
De Gendt, Stefan
,
Heyns, Marc M.
,
Vinckier, Chris
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 317 KB
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2003
58
Single Chemistry Cleaning Solutions for Advanced Wafer Cleaning
Vos, Rita
,
Lux, Marcel
,
Arnauts, Sophia
,
Kenis, Karine
,
Maes, M.
,
Onsia, Bart
,
Snow, James
,
Holsteyns, Frank
,
Vereecke, Guy
,
Mertens, Paul W.
,
Heyns, Marc M.
,
Doll, O.
,
Fester, A.
,
Kolbesen, Bernd O.
,
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 443 KB
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2003
59
Single Chemistry Cleaning with Complexing Agents (CAs): Determination of CA-Lifetimes by UV/VIS-Spectroscopy
Doll, O.
,
Kolbesen, Bernd O.
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 350 KB
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2003
60
Open Circuit Potential Analysis as a Fast Screening Method for the Quality of High-k Dielectric Layers
Claes, Martine
,
Witters, T.
,
Loriaux, G.
,
Van Elshocht, S.
,
Delabie, A.
,
De Gendt, Stefan
,
Heyns, Marc M.
,
Okorn-Schmidt, Harald
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 319 KB
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2003
61
In Situ SymflowTM Etching in an STG® Dryer
Christenson, Kurt K.
,
Lee, Nam Pyo
,
Wagener, Thomas J.
,
Nelson, Steven L.
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 302 KB
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2003
62
Wet Etch Enhancement of HfO2 Films by Implant Processing
Barnett, Joel
,
Riley, Deborah J.
,
Messina, Troy C.
,
Lysaght, Pat
,
Carpio, Ron
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 338 KB
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2003
63
Metallic Contamination Removal Evaluation for Single Wafer Processing
Boelen, Pieter
,
Verhaverbeke, Steven
,
Garnier, Philippe
,
Levy, Didier
,
Morinaga, Hitoshi
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 328 KB
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2003
64
Long-Term Effect of Transportation on Particle Concentrations in Various Process Chemicals
Misat, S.I.
,
De Vos, G.
,
Huysmans, G.
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 306 KB
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2003
65
Accelerated Removal of Photoresist for Semiconductor Production by an Increased-Pressure Ozone and Water Vapor Process
Gale, Glenn W.
,
Toshima, Takayuki
,
Shindo, Naoki
,
Iino, Tadashi
,
Kitahara, Shigenori
,
Taguchi, Keji
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 321 KB
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2003
66
Electrochemical Impedance Spectroscopic Characterization of Hydrophobic Coatings Deposited onto Pre-Oxidized Silicon
Almanza-Workman, Angeles Marcia
,
Raghavan, Srini
,
Deymier, Pierre
,
Petrović, S.
,
Monk, David J.
,
Roop, Ray
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 332 KB
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2003
67
Removal of Heavy Organics by Supercritical CO2
Sehgal, Akshey
,
Yalamanchili, M.R.
,
Millet, C.
,
Danel, Adrien
,
Tardif, F.
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 372 KB
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2003
68
Relation between Surface Contamination of Metals and Defect Formation in Si during Oxidation of Bulk- and SOI-Wafers
Rink, Ingrid
,
De Veirman, A.
,
Janssen, A.J.
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 380 KB
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2003
69
Complexing Agents Employed in Single Chemistry Cleaning: Stability Studies Using HPLC
Metzger, S.
,
Kolbesen, Bernd O.
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 318 KB
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2003
70
Cleaning after Contact Etching of Multi-Film Stack and Cobalt Disilicide: An XPS Study
Chooi, Simon Y.M.
,
Lim, Christopher
,
Liu, Wen Jun
,
Ee, Ping-Yu
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 310 KB
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2003
71
BEOL Post Ash Residue Removal Using DSP* Chemistry in an FSI Batch Spray Tool
Vroom, René
,
Gogg, Georg
,
O'Dwyer, Jerry
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 356 KB
Your tags:
2003
72
A New Industrial Etching & Drying Process for MEMS to Prevent Collapse of Microstructures
Raccurt, O.
,
Arnaud d'Avitaya, F.
,
Charlaix, E.
,
Vareine, T.
,
Tardif, F.
Journal:
Solid State Phenomena
Year:
2003
File:
PDF, 300 KB
Your tags:
2003
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