Generation of Deep Level by Nitrogen Diffusion in Si

Generation of Deep Level by Nitrogen Diffusion in Si

Fuma, N., Tashiro, K., Kakumoto, K., Takano, Y.
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Volume:
196-201
Year:
1995
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.196-201.797
File:
PDF, 307 KB
1995
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