SiGe growth kinetics and doping in reduced pressure-chemical vapor deposition
J.M Hartmann, V Loup, G Rolland, P Holliger, F Laugier, C Vannuffel, M.N SémériaVolume:
236
Year:
2002
Language:
english
Pages:
11
DOI:
10.1016/s0022-0248(01)02085-1
File:
PDF, 358 KB
english, 2002