Modification of Photoresist by UV for Post-Etch Wet Strip Applications
Le, Quoc Toan, Kesters, E., Prager, L., Claes, Martine, Lux, Marcel, Vereecke, GuyVolume:
145-146
Year:
2009
Language:
english
Journal:
Solid State Phenomena
DOI:
10.4028/www.scientific.net/ssp.145-146.323
File:
PDF, 719 KB
english, 2009