Nickel Selective Etch for Contacts on Ge Based Devices

Solid State Phenomena 2014 / 9 Vol. 219

Nickel Selective Etch for Contacts on Ge Based Devices

Sebaai, Farid, Witters, Liesbeth, Holsteyns, Frank, Yukifumi, Yoshida, Mertens, Paul W., De Gendt, Stefan
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Volume:
219
Language:
english
Journal:
Solid State Phenomena
DOI:
10.4028/www.scientific.net/ssp.219.105
Date:
September, 2014
File:
PDF, 342 KB
english, 2014
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