![](/img/cover-not-exists.png)
Quantum chemical modeling for 157 nm photolithography
Robert L Waterland, Kerwin D Dobbs, Amy M Rinehart, Andrew E Feiring, Robert C Wheland, Bruce E SmartVolume:
122
Year:
2003
Language:
english
Pages:
10
DOI:
10.1016/s0022-1139(03)00078-2
File:
PDF, 219 KB
english, 2003