Volume 122; Issue 1

Journal of Fluorine Chemistry

Volume 122; Issue 1

1

Fluorine—an enabler in advanced photolithography

M. Rothschild, T.M. Bloomstein, T.H. Fedynyshyn, V. Liberman, W. Mowers, R. Sinta, M. Switkes, A. Grenville, K. Orvek

Journal:

Journal of Fluorine Chemistry

Year:

2003

Language:

english

File:

PDF, 456 KB

english, 2003

2

Design of very transparent fluoropolymer resists for semiconductor manufacture at 157 nm

A.E. Feiring, M.K. Crawford, W.B. Farnham, J. Feldman, R.H. French, K.W. Leffew, V.A. Petrov, F.L. Schadt III, R.C. Wheland, F.C. Zumsteg

Journal:

Journal of Fluorine Chemistry

Year:

2003

Language:

english

File:

PDF, 123 KB

english, 2003

3

Vacuum-UV influenced design of polymers and dissolution inhibitors for next generation photolithography

Brian C. Trinque, Charles R. Chambers, Brian P. Osborn, Ryan P. Callahan, Geun Su Lee, Shiro Kusumoto, Daniel P. Sanders, Robert H. Grubbs, Willard E. Conley, C.Grant Willson

Journal:

Journal of Fluorine Chemistry

Year:

2003

Language:

english

File:

PDF, 612 KB

english, 2003

4

Time-dependent density functional theory calculations of the photoabsorption of fluorinated alkanes

Chang-Guo Zhan, David A. Dixon, Nobuyuki N. Matsuzawa, Akihiko Ishitani, Tsuyoshi Uda

Journal:

Journal of Fluorine Chemistry

Year:

2003

Language:

english

File:

PDF, 309 KB

english, 2003

5

Quantum chemical modeling for 157 nm photolithography

Robert L Waterland, Kerwin D Dobbs, Amy M Rinehart, Andrew E Feiring, Robert C Wheland, Bruce E Smart

Journal:

Journal of Fluorine Chemistry

Year:

2003

Language:

english

File:

PDF, 219 KB

english, 2003

6

Retrospective of work at Bell Laboratories on the effect of fluorine substitution on the properties of photoacid generators

F.M. Houlihan, O. Nalamasu, E. Reichmanis

Journal:

Journal of Fluorine Chemistry

Year:

2003

Language:

english

File:

PDF, 232 KB

english, 2003

7

Iodonium zwitterions

Darryl D. DesMarteau, William T. Pennington, Vittorio Montanari, Brian H. Thomas

Journal:

Journal of Fluorine Chemistry

Year:

2003

Language:

english

File:

PDF, 219 KB

english, 2003

8

Novel hydrofluorocarbon polymers for use as pellicles in 157 nm semiconductor photolithography: fundamentals of transparency

Roger H French, Robert C Wheland, Weiming Qiu, M.F Lemon, Edward Zhang, Joseph Gordon, Viacheslav A Petrov, Victor F Cherstkov, Nina I Delaygina

Journal:

Journal of Fluorine Chemistry

Year:

2003

Language:

english

File:

PDF, 408 KB

english, 2003

9

Properties and production of F-doped silica glass

Charlene M. Smith, Lisa A. Moore

Journal:

Journal of Fluorine Chemistry

Year:

2003

Language:

english

File:

PDF, 142 KB

english, 2003

10

Fluorinated compounds for advanced IC interconnect applications: a survey of chemistries and processes

Michael T. Mocella

Journal:

Journal of Fluorine Chemistry

Year:

2003

Language:

english

File:

PDF, 245 KB

english, 2003

11

Fluorocarbon dielectrics via hot filament chemical vapor deposition

Kenneth K.S. Lau, Shashi K. Murthy, Hilton G.Pryce Lewis, Jeffrey A. Caulfield, Karen K. Gleason

Journal:

Journal of Fluorine Chemistry

Year:

2003

Language:

english

File:

PDF, 200 KB

english, 2003

12

Parylene-AF4: a polymer with exceptional dielectric and thermal properties

William R. Dolbier Jr., William F. Beach

Journal:

Journal of Fluorine Chemistry

Year:

2003

Language:

english

File:

PDF, 200 KB

english, 2003

13

Fluorinated gases for semiconductor manufacture: process advances in chemical vapor deposition chamber cleaning

Charles C. Allgood

Journal:

Journal of Fluorine Chemistry

Year:

2003

Language:

english

File:

PDF, 221 KB

english, 2003

14

Perfluoroelastomer and fluoroelastomer seals for semiconductor wafer processing equipment

Shuhong Wang, John M. Legare

Journal:

Journal of Fluorine Chemistry

Year:

2003

Language:

english

File:

PDF, 238 KB

english, 2003

15

The use of fluoropolymers to protect semiconductor materials

Journal:

Journal of Fluorine Chemistry

Year:

2003

Language:

english

File:

PDF, 190 KB

english, 2003

16

Preface

Journal:

Journal of Fluorine Chemistry

Year:

2003

Language:

english

File:

PDF, 42 KB

english, 2003

17

IFC

Journal:

Journal of Fluorine Chemistry

Year:

2003

Language:

english

File:

PDF, 57 KB

english, 2003

18

Graphical Abstracts

Journal:

Journal of Fluorine Chemistry

Year:

2003

Language:

english

File:

PDF, 223 KB

english, 2003

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