High performance a-Si:H thin film transistors based on...

High performance a-Si:H thin film transistors based on aluminum gate metallization

A Nathan, R.V.R Murthy, B Park, S.G Chamberlain
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Volume:
40
Year:
2000
Language:
english
Pages:
7
DOI:
10.1016/s0026-2714(00)00012-3
File:
PDF, 1.41 MB
english, 2000
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