A new empirical extrapolation method for time-dependent...

Microelectronics Reliability 2002 Vol. 42; Iss. 3

A new empirical extrapolation method for time-dependent dielectric breakdown reliability projections of thin SiO2 and nitride–oxide dielectrics

Fen Chen, Rolf-Peter Vollertsen, Baozhen Li, Dave Harmon, Wing L. Lai
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
42
Year:
2002
Language:
english
Pages:
7
DOI:
10.1016/s0026-2714(01)00261-x
File:
PDF, 150 KB
english, 2002
Conversion to is in progress
Conversion to is failed