Reliability of nitrided wet silicon dioxide thin films in...

Microelectronics Reliability 1998 Vol. 38; Iss. 6-8

Reliability of nitrided wet silicon dioxide thin films in WSi2 or TaSi2 polycide process : influence of the nitridation temperature

K. Yckache, P. Boivin, F. Baiget, S. Radja, G. Auriel, B. Sagnes, J. Ouahd, A. Glachant
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Volume:
38
Year:
1998
Language:
english
Pages:
6
DOI:
10.1016/s0026-2714(98)00120-6
File:
PDF, 524 KB
english, 1998
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