Low pressure chemical vapor deposition from TEOS–NH3...

Microelectronics Reliability 1999 Vol. 39; Iss. 2

Low pressure chemical vapor deposition from TEOS–NH3 mixtures: thermochemical study of the process considering kinetic data

C. Vahlas, V.Em. Vamvakas, D. Davazoglou
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Volume:
39
Year:
1999
Language:
english
Pages:
7
DOI:
10.1016/s0026-2714(98)00230-3
File:
PDF, 291 KB
english, 1999
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