![](/img/cover-not-exists.png)
Experimental study of the current characteristics of thin silicon oxide films under dynamic stress
J.-W Zahlmann-Nowitzki, L Nebrich, P SeegebrechtVolume:
45
Year:
2001
Language:
english
Pages:
8
DOI:
10.1016/s0038-1101(00)00269-0
File:
PDF, 205 KB
english, 2001