Structural dependence of breakdown characteristics and...

Structural dependence of breakdown characteristics and electrical degradation in ultrathin RPECVD oxide/nitride gate dielectrics under constant voltage stress

Yi-Mu Lee, Yider Wu, Choelhwyi Bae, Joon Goo Hong, Gerald Lucovsky
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Volume:
47
Year:
2003
Language:
english
Pages:
6
DOI:
10.1016/s0038-1101(02)00257-5
File:
PDF, 450 KB
english, 2003
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