Effects of first rapid thermal annealing temperature on Co...

Solid-State Electronics 2003 Vol. 47; Iss. 8

Effects of first rapid thermal annealing temperature on Co silicide formation

H.J. Peng, Z.X. Shen, E.H. Lim, C.W. Lai, R. Liu, A.T.S. Wee, A. Sameer, J.Y. Dai, B.C. Zhang, J.Z. Zheng
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
47
Year:
2003
Language:
english
Pages:
5
DOI:
10.1016/s0038-1101(03)00008-x
File:
PDF, 296 KB
english, 2003
Conversion to is in progress
Conversion to is failed