Optimization of plasma nitridation for reliability...

Solid-State Electronics 2003 Vol. 47; Iss. 11

Optimization of plasma nitridation for reliability enhancement of low-temperature gate dielectric in MOS devices

David C.T. Or, P.T. Lai, J.K.O. Sin
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Volume:
47
Year:
2003
Language:
english
Pages:
5
DOI:
10.1016/s0038-1101(03)00260-0
File:
PDF, 108 KB
english, 2003
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