Reliability of HfSiON gate dielectrics

Semiconductor Science and Technology 2005 / 01 Vol. 20; Iss. 1

Reliability of HfSiON gate dielectrics

O'Connor, Robert, Hughes, Greg, Degraeve, Robin, Kaczer, Ben, Kauerauf, Thomas
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Volume:
20
Language:
english
Journal:
Semiconductor Science and Technology
DOI:
10.1088/0268-1242/20/1/011
Date:
January, 2005
File:
PDF, 147 KB
english, 2005
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