Microwave plasma enhanced CVD of aluminum oxide films: OES...

Thin Solid Films 2001 Vol. 390; Iss. 1-2

Microwave plasma enhanced CVD of aluminum oxide films: OES diagnostics and influence of the RF bias

P. Tristant, Z. Ding, Q.B. Trang Vinh, H. Hidalgo, J.L. Jauberteau, J. Desmaison, C. Dong
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Volume:
390
Year:
2001
Language:
english
Pages:
8
DOI:
10.1016/s0040-6090(01)00924-5
File:
PDF, 227 KB
english, 2001
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