Damage-Free Post-CMP Cleaning Solution for Low-k...

Solid State Phenomena 2009 Vol. 145-146

Damage-Free Post-CMP Cleaning Solution for Low-k Fluorocarbon on Advanced Interconnects

Gu, Xun, Nemoto, Takenao, Teramoto, Akinobu, Hasebe, Rui, Ito, Takashi, Ohmi, Tadahiro
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Volume:
145-146
Year:
2009
Language:
english
Journal:
Solid State Phenomena
DOI:
10.4028/www.scientific.net/SSP.145-146.381
File:
PDF, 3.30 MB
english, 2009
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