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Chemical–mechanical polishing for giant magnetoresistance device integration
Y.Z Hu, R.J Gutmann, T.P Chow, B WitcraftVolume:
332
Year:
1998
Language:
english
Pages:
6
DOI:
10.1016/s0040-6090(98)01016-5
File:
PDF, 362 KB
english, 1998