Control of silicon particle behavior using a low frequency...

Control of silicon particle behavior using a low frequency electromagnetic field in silane plasma chemical vapor deposition

Sung-Chae Yang, Hiroshi Fujiyama
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Volume:
341
Year:
1999
Language:
english
Pages:
4
DOI:
10.1016/s0040-6090(98)01521-1
File:
PDF, 196 KB
english, 1999
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