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Oxidation, grain growth and reflow characteristics of copper thin films prepared by chemical vapor deposition
S.-Y. Lee, S.-H. Choi, C.-O. ParkVolume:
359
Year:
2000
Language:
english
Pages:
7
DOI:
10.1016/s0040-6090(99)00758-0
File:
PDF, 814 KB
english, 2000