Influence of H2O partial pressure in the sputtering chamber on the crystallinity and relative dielectric constant of SrTiO3 thin film prepared at low substrate temperature
Osamu Nakagawara, Kei Fujibayashi, Takahiro Makino, Yuzo KatayamaVolume:
59
Year:
2000
Language:
english
Pages:
6
DOI:
10.1016/s0042-207x(00)00342-0
File:
PDF, 217 KB
english, 2000