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Volume 59; Issue 2-3
Main
Vacuum
Volume 59; Issue 2-3
Vacuum
Volume 59; Issue 2-3
1
Yttria-stabilized zirconia (YSZ) heteroepitaxially grown on Si substrates by reactive sputtering
Tomonobu Hata
,
Kenji Sasaki
,
Yohko Ichikawa
,
Kimihiro Sasaki
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 462 KB
Your tags:
english, 2000
2
Improvement of the electrical properties of heteroepitaxial yttria-stabilized zirconia (YSZ) films on Si prepared by reactive sputtering
S Horita
,
H Nakajima
,
T Kuniya
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 193 KB
Your tags:
english, 2000
3
Epitaxial growth properties of Si and SiGe films prepared by ion beam sputtering process
K Sasaki
,
H Nagai
,
T Hata
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 350 KB
Your tags:
english, 2000
4
Effect of substrate surface morphology and interface microstructure in ZnO thin films formed on various substrates
Y Yoshino
,
K Inoue
,
M Takeuchi
,
T Makino
,
Y Katayama
,
T Hata
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 598 KB
Your tags:
english, 2000
5
Initial growth characteristic of Ni–Cu films deposited on MgO(0 0 1) by DC-biased plasma sputtering
Hong Qiu
,
Mituru Hashimoto
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 2.64 MB
Your tags:
english, 2000
6
Effects of partial oxygen pressure on the crystal growth of PbTiO3 thin films on miscut (0 0 1)SrTiO3
Y Ichikawa
,
H Adachi
,
R Ai
,
K Wasa
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 582 KB
Your tags:
english, 2000
7
TwinMag II: Improving an advanced sputtering tool
U Heister
,
J Krempel-Hesse
,
J Szczyrbowski
,
G Teschner
,
J Bruch
,
G Bräuer
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 236 KB
Your tags:
english, 2000
8
650 mm×830 mm area sputtering deposition using a separated magnet system
Tomoyuki Seino
,
Tadashi Sato
,
Mitsuhiro Kamei
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 363 KB
Your tags:
english, 2000
9
Development of biased directional sputtering (BDS) for barrier metal formation
H Sato
,
M Sato
,
M Tagami
,
K Funato
,
M Sasaki
,
S Taguchi
,
S Mizuno
,
M Kobayashi
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 458 KB
Your tags:
english, 2000
10
Development of a locally electron-heated plasma source
H. Seki
,
S. Kitazawa
,
Y. Ueno
,
N. Wada
,
S. Takemori
,
T. Sato
,
S. Uchikawa
,
E. Setoyama
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 208 KB
Your tags:
english, 2000
11
Properties of high-density (Pb, La) (Zr, Ti) O3 ceramics for sputtering targets
K Hidaka
,
S Hashiguchi
,
S Nagayama
,
P Kim
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 1.22 MB
Your tags:
english, 2000
12
Holey-plate plasma source for plasma processing
Y Yoshida
,
H Ogura
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 238 KB
Your tags:
english, 2000
13
Magnetron sputtering cathode with confined magnetic flux
Ryuta Ai
,
Kiyotaka Wasa
,
Yoko Ichikawa
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 331 KB
Your tags:
english, 2000
14
Internal-antenna-driven inductive RF discharges for development of large-area high-density plasma sources with suppressed electrostatic coupling
S Miyake
,
Y Setsuhara
,
Y Sakawa
,
T Shoji
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 362 KB
Your tags:
english, 2000
15
Light-absorbing wide-band AR coatings on PET films by sputtering
Takuji Oyama
,
Tomohiro Yamada
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 95 KB
Your tags:
english, 2000
16
Some issues on hydrogen and hydrogenation of plasma enhanced chemical vapor deposited films in a-Si : H thin-film transistors
Yue Kuo
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 174 KB
Your tags:
english, 2000
17
Phonon scattering in electron transport phenomena of ITO films
Naoto Kikuchi
,
Eiji Kusano
,
Hidehito Nanto
,
Akira Kinbara
,
Hideo Hosono
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 179 KB
Your tags:
english, 2000
18
Low ohm large area ITO coating by reactive magnetron sputtering in DC and MF mode
J Strümpfel
,
C May
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 188 KB
Your tags:
english, 2000
19
Hydrophilic characteristics of rf-sputtered amorphous TiO2 film
M Nakamura
,
T Aoki
,
Y Hatanaka
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 292 KB
Your tags:
english, 2000
20
Basic characteristics of TiO2 film for environmental purification deposited by electron-beam-excited plasma
Shunjiro Ikezawa
,
Futoshi Mutsuga
,
Takanori Kubota
,
Ren Suzuki
,
Kiyohide Baba
,
Shinken Koh
,
Toshitaro Yoshioka
,
Akira Nishiwaki
,
Keisuke Kida
,
Yoshihiko Ninomiya
,
Koichi Wakita
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 273 KB
Your tags:
english, 2000
21
Hard disk media: future problems and possible solutions
David N. Lambeth
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 184 KB
Your tags:
english, 2000
22
Precise determination of the refractive index of sputtered MgO thin films in the visible light range
Shigeru Baba
,
Isao Mori
,
Takeo Nakano
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 308 KB
Your tags:
english, 2000
23
Optimization of zinc oxide thin film for surface acoustic wave filters by radio frequency sputtering
Y Yoshino
,
T Makino
,
Y Katayama
,
T Hata
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 326 KB
Your tags:
english, 2000
24
Conductive transparent films deposited by simultaneous sputtering of zinc-oxide and indium-oxide targets
K Tominaga
,
T Murayama
,
I Mori
,
T Okamoto
,
K Hiruta
,
T Moriga
,
I Nakabayashi
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 229 KB
Your tags:
english, 2000
25
Focusing efficiency of a multilayer Fresnel zone plate for hard X-ray fabricated by DC sputtering deposition
Shigeharu Tamura
,
Kensuke Murai
,
Nagao Kamijo
,
Kunio Yoshida
,
Hiroshi Kihara
,
Yoshio Suzuki
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 195 KB
Your tags:
english, 2000
26
Preparation and properties of Pb(Zr, Ti)O3 thin films deposited on Ir electrodes using a sputtering apparatus
Je-Deok Kim
,
Kimihiro Sasaki
,
Tomonobu Hata
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 201 KB
Your tags:
english, 2000
27
Tribological properties of a-C : N and a-C films prepared by shielded arc ion plating
N Tajima
,
H Saze
,
H Sugimura
,
O Takai
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 197 KB
Your tags:
english, 2000
28
Relation between the flux of energetic oxygen ions and the sputtered metal atoms in oxide film deposition by reactive sputtering
Kikuo Tominaga
,
Ichiro Mori
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 220 KB
Your tags:
english, 2000
29
Pressure dependence of optical emission from DC magnetron sputtering plasma observed with spatial resolution
Takeo Nakano
,
Noriyuki Ohnuki
,
Shigeru Baba
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 105 KB
Your tags:
english, 2000
30
Ion fraction and energy distribution of Ti flux incident to substrate surface in RF-plasma enhanced magnetron sputtering
K Fukushima
,
E Kusano
,
N Kikuchi
,
T Saito
,
S Saiki
,
H Nanto
,
A Kinbara
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 231 KB
Your tags:
english, 2000
31
RF sputtering of polymers and its potential application
H Biederman
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 209 KB
Your tags:
english, 2000
32
Mass spectrometry and absorption spectroscopy for oxidation of titanium target in rf magnetron sputtering
Kunio Okimura
,
Tadashi Nakamura
,
Akira Shibata
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 144 KB
Your tags:
english, 2000
33
Pinholes in Al thin films: their effects on TFT characteristics and a taguchi method analysis of their origins
Hiroshi Takatsuji
,
Toshiaki Arai
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 258 KB
Your tags:
english, 2000
34
Early stages of ITO deposition on glass or polymer substrates
Y Shigesato
,
R Koshi-ishi
,
T Kawashima
,
J Ohsako
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 354 KB
Your tags:
english, 2000
35
Preparation and thickness dependence of magnetic properties of (1 1 1)-oriented Mg1.5FeTi0.5O4 spinel films on sapphire by pulsed laser deposition technique
Y Muraoka
,
K Ueda
,
H Tabata
,
T Kawai
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 139 KB
Your tags:
english, 2000
36
Preparation of BST ferroelectric thin film by pulsed laser ablation for dielectric bolometers
Huaping Xu
,
Hong Zhu
,
K Hashimoto
,
T Kiyomoto
,
T Mukaigawa
,
R Kubo
,
Y Yoshino
,
M Noda
,
Y Suzuki
,
M Okuyama
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 304 KB
Your tags:
english, 2000
37
Novel thin-film fabrication method combining pulsed laser ablation and catalytic chemical vapor deposition: application to preparation of Er-doped hydrogenated amorphous Si films
Atsushi Masuda
,
Joe Sakai
,
Hideki Matsumura
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 147 KB
Your tags:
english, 2000
38
Low-temperature growth of low-resistivity indium-tin-oxide thin films by pulsed laser deposition
F.O Adurodija
,
H Izumi
,
T Ishihara
,
H Yoshioka
,
H Matsui
,
M Motoyama
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 199 KB
Your tags:
english, 2000
39
Aluminum nitride thin films prepared by radical-assisted pulsed laser deposition
M Ishihara
,
K Yamamoto
,
F Kokai
,
Y Koga
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 175 KB
Your tags:
english, 2000
40
New DLC coating method using magnetron plasma in an unbalanced magnetic field
S Fujimaki
,
H Kashiwase
,
Y Kokaku
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 203 KB
Your tags:
english, 2000
41
Uniform deposition of SiC thin films on plastics surfaces
H Anma
,
J Toki
,
T Ikeda
,
Y Hatanaka
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 168 KB
Your tags:
english, 2000
42
Silicon selective growth on partially oxidized substrate by ECR plasma CVD technique
K Sasaki
,
T Takada
,
Y Yoshida
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 249 KB
Your tags:
english, 2000
43
Low-temperature growth and n-type doping of CdTe by the remote-plasma-assisted metalorganic chemical vapor deposition method
Madan Niraula
,
Daisuke Mochizuki
,
Toru Aoki
,
Yoichiro Nakanishi
,
Yoshinori Hatanaka
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 271 KB
Your tags:
english, 2000
44
Effect of microwave ferrite on the density distribution of microwave-superposed inductively coupled plasma
S Okuji
,
N Sakudo
,
K Hayashi
,
K Fujimura
,
Y Nishiyama
,
K Toyoda
,
S Yashima
,
T Ishida
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 310 KB
Your tags:
english, 2000
45
Dependence of metal sheet resistance on metal etch/post-etch treatment and subsequent process conditions
K.J Yoo
,
S.H Chi
,
M.H Yim
,
S.B Han
,
S.J Choi
,
J.H Ha
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 748 KB
Your tags:
english, 2000
46
Epitaxial growth of CdSeTe films by remote plasma enhanced metal organic chemical vapor deposition
Daiji Noda
,
Toru Aoki
,
Yoichiro Nakanishi
,
Yoshinori Hatanaka
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 148 KB
Your tags:
english, 2000
47
Measurements of negative ion density in fluorocarbon ECR plasma
M Shindo
,
Y Ueda
,
S Kawakami
,
N Ishii
,
Y Kawai
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 233 KB
Your tags:
english, 2000
48
Formation process of Ni–N films by reactive sputtering at different substrate temperatures
M Kawamura
,
Y Abe
,
K Sasaki
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 159 KB
Your tags:
english, 2000
49
Ultrathin Al2O3 and AlN films deposited by reactive sputter using advanced electron cyclotron resonance plasma source
M. Shimada
,
T. Amazawa
,
T. Ono
,
S. Matsuo
,
H. Oikawa
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 313 KB
Your tags:
english, 2000
50
Deposition of TiC films by dual source dc magnetron sputtering
S Inoue
,
Y Wada
,
K Koterazawa
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 183 KB
Your tags:
english, 2000
51
Influence of H2O partial pressure in the sputtering chamber on the crystallinity and relative dielectric constant of SrTiO3 thin film prepared at low substrate temperature
Osamu Nakagawara
,
Kei Fujibayashi
,
Takahiro Makino
,
Yuzo Katayama
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 217 KB
Your tags:
english, 2000
52
Boron nitride thin films synthesized by reactive sputtering
C Hu
,
S Kotake
,
Y Suzuki
,
M Senoo
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 564 KB
Your tags:
english, 2000
53
Optical and structural properties of dense SiO2, Ta2O5 and Nb2O5 thin-films deposited by indirectly reactive sputtering technique
Yizhou Song
,
Takeshi Sakurai
,
Kazuhiko Maruta
,
Akinori Matusita
,
Shigeharu Matsumoto
,
Shinichiro Saisho
,
Kazuo Kikuchi
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 241 KB
Your tags:
english, 2000
54
Effect of d.c. bias on the deposition rate using r.f.–d.c. coupled magnetron sputtering for SnNx thin films
R Kamei
,
T Migita
,
T Tanaka
,
K Kawabata
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 183 KB
Your tags:
english, 2000
55
Effects of double bonding configurations on thermal stability of low-hydrogen concentration fluorinated amorphous carbon thin-films with low dielectric constant prepared by sputtering with hydrogen dilution
H Yokomichi
,
A Masuda
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 168 KB
Your tags:
english, 2000
56
Surface morphology of TiN films reactively deposited by bias sputtering
T Takahashi
,
K Masugata
,
H Kawai
,
S Kontani
,
J Yamamoto
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 408 KB
Your tags:
english, 2000
57
Effect of the hydrogen partial pressure ratio on the properties of μc-Si : H films prepared by rf magnetron sputtering
H Makihara
,
A Tabata
,
Y Suzuoki
,
T Mizutani
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 176 KB
Your tags:
english, 2000
58
Sputtered silver-based low-emissivity coatings with high moisture durability
E. Ando
,
S. Suzuki
,
N. Aomine
,
M. Miyazaki
,
M. Tada
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 530 KB
Your tags:
english, 2000
59
Preparation and characterization of highly oriented Pb(Zr, Ti)O3 thin films with seeding titanium layer deposited at low temperature by facing target sputtering
Xin-Shan Li
,
Tsunehisa Tanaka
,
Yoshihiko Suzuki
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 211 KB
Your tags:
english, 2000
60
Effect of input power on crystal orientation and residual stress in AlN film deposited by dc sputtering
K Kusaka
,
D Taniguchi
,
T Hanabusa
,
K Tominaga
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 229 KB
Your tags:
english, 2000
61
Ultra-clean sputtering process for magnetic thin films on hard disk drives
Migaku Takahashi
,
M Tsunoda
,
H Shoji
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 586 KB
Your tags:
english, 2000
62
Large-area production of solar absorbent multilayers by MF-pulsed plasma technology
F Milde
,
M Dimer
,
Ch Hecht
,
D Schulze
,
P Gantenbein
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 617 KB
Your tags:
english, 2000
63
TiO2−X sputter for high rate deposition of TiO2
Yuko Tachibana
,
Hisashi Ohsaki
,
Atsushi Hayashi
,
Akira Mitsui
,
Yasuo Hayashi
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 192 KB
Your tags:
english, 2000
64
Reactively sputtered ternary films of the type TM–Si–N and their properties (TM=early transition metal)
Marc-A Nicolet
Journal:
Vacuum
Year:
2000
Language:
english
File:
PDF, 67 KB
Your tags:
english, 2000
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