Sub-quarter micron metallization using ionized metal plasma...

Sub-quarter micron metallization using ionized metal plasma (IMP) technology

Y Tanaka, Z Xu, P Gopalraja, J Forster, G Yao, H Zhang, J Nulman, F Chen
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Volume:
51
Year:
1998
Language:
english
Pages:
5
DOI:
10.1016/s0042-207x(98)00295-4
File:
PDF, 416 KB
english, 1998
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