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Volume 51; Issue 4
Main
Vacuum
Volume 51; Issue 4
Vacuum
Volume 51; Issue 4
1
Fundamentals of plasma and sputtering processes
A. Kinbara
,
E. Kusano
,
I. Kondo
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 189 KB
Your tags:
english, 1998
2
A sputter equipment simulation system for Vlsi device
T Ohta
,
H Yamada
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 650 KB
Your tags:
english, 1998
3
Simulation of particle transport in high pressure sputtering
Takeo Nakano
,
Shigeru Baba
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 322 KB
Your tags:
english, 1998
4
Multichannel process monitor for real-time film thickness and rate measurements in dry etching and deposition
F Heinrich
,
D Heinze
,
T Kowalski
,
P Hoffmann
,
P Kopperschmidt
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 498 KB
Your tags:
english, 1998
5
A role of energetic ions in RF-biased PECVD of TiO2
Young Hoon Lee
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 406 KB
Your tags:
english, 1998
6
Reaction mechanism of trilevel resist etching in O2/SO2 plasma: controlling factors for sidewall passivation
J.H. Ha
,
D.H. Yi
,
J.J. Kim
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 4.17 MB
Your tags:
english, 1998
7
Plasma diagnosis and low-substrate-temperature deposition of Ba ferrite films in a damage-free sputtering apparatus with mixed gases
Nobuhiro Matsushita
,
Kenji Noma
,
Shigeki Nakagawa
,
Masahiko Naoe
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 1.04 MB
Your tags:
english, 1998
8
Syntheses and optical properties of low-temperature SiOx and TiOx thin films prepared by plasma enhanced CVD
Yizhou Song
,
Takeshi Sakurai
,
Koichi Kishimoto
,
Kazuhiko Maruta
,
Shigeharu Matsumoto
,
Kazuo Kikuchi
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 493 KB
Your tags:
english, 1998
9
Shading damage in sputter cleaning using Ar gas plasma
M Aoyama
,
T Ito
,
M Inoue
,
Y Shioya
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 346 KB
Your tags:
english, 1998
10
Etching action by atomic hydrogen and low temperature silicon epitaxial growth on ECR plasma CVD
K. Sasaki
,
H. Tomoda
,
T. Takada
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 374 KB
Your tags:
english, 1998
11
Heteroepitaxial growth of YSZ films on Si(100) substrate by using new metallic mode of reactive sputtering
T. Hata
,
S. Nakano
,
Y. Masuda
,
K. Sasaki
,
Y. Haneda
,
K. Wasa
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 579 KB
Your tags:
english, 1998
12
Crystal growth of epitaxially grown PbTiO3 thin films on miscut SrTiO3 substrate
K Wasa
,
Y Haneda
,
T Sato
,
H Adachi
,
K Setsune
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 439 KB
Your tags:
english, 1998
13
K-M-S (keep-molecules sputtering) deposition of optical MgF2 thin films
K Kawamata
,
T Shouzu
,
N Mitamura
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 451 KB
Your tags:
english, 1998
14
Improvement of thickness distribution and crystallinity of ZnO thin films prepared by radio frequency planer magnetron sputtering
M Takeuchi
,
K Inoue
,
Y Yoshino
,
K Ohwada
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 358 KB
Your tags:
english, 1998
15
Compact sputtering apparatus for depositing Co–Cr alloy thin films in magnetic disks
Yoshitaka Kitamoto
,
Masanori Abe
,
Masahiko Naoe
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 347 KB
Your tags:
english, 1998
16
Effects of interface micro structure in crystallization of ZnO thin films prepared by radio frequency sputtering
Y Yoshino
,
K Inoue
,
M Takeuchi
,
K Ohwada
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 747 KB
Your tags:
english, 1998
17
Effect of an interfacial layer on adhesion strength deterioration between a copper thin film and polyimide substrates
Satoru Iwamori
,
Takehiro Miyashita
,
Shin Fukuda
,
Shouhei Nozaki
,
Kazufuyu Sudoh
,
Nobuhiro Fukuda
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 243 KB
Your tags:
english, 1998
18
ZnTe epitaxial growth by remote plasma enhanced metal organic chemical vapor deposition
Daiji Noda
,
Toru Aoki
,
Yoichiro Nakanishi
,
Yoshinori Hatanaka
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 307 KB
Your tags:
english, 1998
19
Preparation and photocatalysis evaluation of anatase film on Pt-buffered polyimide
J Sheng
,
L Shivalingappa
,
J Karasawa
,
T Fukami
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 732 KB
Your tags:
english, 1998
20
Cathodic arc deposition of titanium nitride coatings on commercial steels
Z Iqbal
,
A Rauf
,
A Ali
,
A ul Haq
,
AQ Khan
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 383 KB
Your tags:
english, 1998
21
Noble gas influence on reactive radio frequency magnetron sputter deposition of TiN films
C.P Lungu
,
M Futsuhara
,
O Takai
,
M Braic
,
G Musa
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 542 KB
Your tags:
english, 1998
22
High-rate reactive DC magnetron sputtering of oxide and nitride superlattice coatings
WD Sproul
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 368 KB
Your tags:
english, 1998
23
Manufacture of complex optical multilayer filters using an automated deposition system
BT Sullivan
,
JA Dobrowolski
,
G Clarke
,
T Akiyama
,
N Osborne
,
M Ranger
,
L Howe
,
A Matsumoto
,
Y Song
,
K Kikuchi
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 735 KB
Your tags:
english, 1998
24
Mid frequency sputtering with TwinMag®-a survey of recent results
G Bräuer
,
M Ruske
,
J Szczyrbowski
,
G Teschner
,
A Zmelty
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 330 KB
Your tags:
english, 1998
25
Origin of oxygen in Pb(Zr,Ti)O3 films prepared by metal-oxide combined target
K Sasaki
,
WX Zhang
,
T Hata
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 361 KB
Your tags:
english, 1998
26
Proposal of new mixture target for PZT thin films by reactive sputtering
T Hata
,
S Kawagoe
,
W Zhang
,
K Sasaki
,
Y Yoshioka
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 1.10 MB
Your tags:
english, 1998
27
Physical properties of reactive sputtered tin-nitride thin films
Y Inoue
,
M Nomiya
,
O Takai
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 302 KB
Your tags:
english, 1998
28
Structure and properties of CeN thin films deposited in arc discharge
S.Q. Xiao
,
K. Tsuzuki
,
C.P. Lungu
,
O. Takai
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 270 KB
Your tags:
english, 1998
29
The effects of B2 structured underlayers on thin film magnetic recording media
Li-Lien Lee
,
D.E. Laughlin
,
D.N. Lambeth
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 770 KB
Your tags:
english, 1998
30
Development of a locally-electron-heated plasma source for HDP-CVD process
H. Seki
,
Y. Ueno
,
S. Ichimura
,
S. Takemori
,
S. Uchikawa
,
H. Murakamia
,
S. Okada
,
Y. Mochizuki
,
E. Setoyama
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 309 KB
Your tags:
english, 1998
31
Uniform growth of compound-semiconductor film over 10 inch circle by controlling entrance effects by diffusion mixing between 3 layered flows
Koh Matsumoto
,
Takayuki Arai
,
Hiroki Tokunaga
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 279 KB
Your tags:
english, 1998
32
Plasma enhanced chemical vapor deposited silicon nitride as a gate dielectric film for amorphous silicon thin film transistors—a critical review
Yue Kuo
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 400 KB
Your tags:
english, 1998
33
Silicon nitride film growth by remote plasma CVD using Tris(dimethylamino)silane
Toru Aoki
,
Takuya Ogishima
,
Aleksander M Wróbel
,
Yoichiro Nakanishi
,
Yoshinori Hatanaka
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 230 KB
Your tags:
english, 1998
34
High rate deposition of a-Si:H and a-SiNx:H by VHF PECVD
T Takagi
,
K Takechi
,
Y Nakagawa
,
Y Watabe
,
S Nishida
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 322 KB
Your tags:
english, 1998
35
Optimization of extrinsic TFT mobility on 550 mm×650 mm large glass
M. Takeichi
,
S. Takahashi
,
H. Kitahara
,
Steven L. Wright
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 521 KB
Your tags:
english, 1998
36
Two-step-etching process of MoW gate metal on large TFT glass substrates
Kenji Okajima
,
Takayuki Sato
,
Takayoshi Dohi
,
Mitsuru Shibata
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 490 KB
Your tags:
english, 1998
37
Low temperature polycrystalline silicon thin film transistors
Jin Jang
,
Jai Il Ryu
,
Soo Young Yoon
,
Kyung Ha Lee
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 544 KB
Your tags:
english, 1998
38
Reactive ion etching of indium tin oxide by SiCl4-based plasmas—substrate temperature effect
Yue Kuo
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 175 KB
Your tags:
english, 1998
39
Ultra-thin silicon-oxide films by sputter-deposition and their application to high-quality poly-Si TFTS
T Serikawa
,
S Shirai
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 448 KB
Your tags:
english, 1998
40
Effects of CH4 addition to Ar–O2 discharge gases on resistivity and structure of ITO coatings
E Kusano
,
N Kashiwagi
,
T Kobayashi
,
H Nanto
,
I Kondo
,
A Kinbara
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 442 KB
Your tags:
english, 1998
41
Preparation of zinc oxide/metal oxide multilayered thin films for low-voltage varistors
N Horio
,
M Hiramatsu
,
M Nawata
,
K Imaeda
,
T Torii
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 288 KB
Your tags:
english, 1998
42
Sub-quarter micron metallization using ionized metal plasma (IMP) technology
Y Tanaka
,
Z Xu
,
P Gopalraja
,
J Forster
,
G Yao
,
H Zhang
,
J Nulman
,
F Chen
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 416 KB
Your tags:
english, 1998
43
A new technique for monitoring the microscopic electronic surface structures of sputtered thin films
K. Obara
,
P. Yiji
,
Y. Suemoto
,
T. Ogushi
,
W. Möller
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 591 KB
Your tags:
english, 1998
44
The application of high density plasma sources for optoelectronic devicefabrication
Bedwyr Humphreys
,
Matthew Govett
,
Andrew Goodyear
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 645 KB
Your tags:
english, 1998
45
Magnetic field dependence of AlN film properties in dc planar magnetron sputtering with opposed targets
K. Tominaga
,
T. Ao
,
Y. Sato
,
I. Mori
,
K. Kusaka
,
T. Hanabusa
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 484 KB
Your tags:
english, 1998
46
Control of Cl2 plasma by electron-beam-excited plasma and poly-Si etching
Yasuhiro Mikawa
,
Ryu-ichi Miyano
,
Jun-ichi Inaguma
,
Yasunori Shiraki
,
Futoshi Mutsuga
,
Motoyuki Fujii
,
Shunjiro Ikezawa
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 629 KB
Your tags:
english, 1998
47
Control of nano-structure of the initial growth layers of Co–Cr thin films deposited by facing targets sputtering
Shigeki Nakagawa
,
Masahiko Naoe
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 504 KB
Your tags:
english, 1998
48
Effects of He on Cu film formation by rf sputtering
T Koyanagi
,
K Takao
,
Y Fukuma
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 854 KB
Your tags:
english, 1998
49
Material properties of heteroepitaxial yttria-stabilized zirconia films with controlled yttria contents on Si prepared by reactive sputtering
S Horita
,
M Watanabe
,
S Umemoto
,
A Masuda
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 338 KB
Your tags:
english, 1998
50
Reduction of residual stress for ZnO/Al thin films on glass substrate prepared by radio frequency magnetron sputtering
K Sakaguchi
,
S Iwasa
,
Y Yoshino
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 409 KB
Your tags:
english, 1998
51
Advanced sputtering techniques for high rate-, plasma free- deposition and excellent target utility with uniform erosion
S Kadokura
,
M Naoe
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 272 KB
Your tags:
english, 1998
52
Novel facing targets sputtering apparatus with uniform magnetic field and plasma-free substrates
Kohki Noda
,
Toyoaki Hirata
,
Takashi Kawanabe
,
Masahiko Naoe
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 438 KB
Your tags:
english, 1998
53
Effects of ion bombardment to interfaces on residual internal stress and crystallite structures on multilayered films
Y Miyamoto
,
K Watanabe
,
S Nakagawa
,
M Naoe
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 423 KB
Your tags:
english, 1998
54
Analysis of stray magnetic field at the substrate and effect of applying external magnetic field in facing targets sputtering
T Ichihara
,
S Nakagawa
,
M Naoe
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 410 KB
Your tags:
english, 1998
55
Stress reduction of chromium thin films deposited by cluster-type sputtering system for ultra-large-size (550×650 mm) substrates
Katsunori Nakajima
,
,
Ken-ichi Onisawa
,
Ken-ichi Chahara
,
Tetsuroh Minemura
,
Mitsuhiro Kamei
,
Eiji Setoyama
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 308 KB
Your tags:
english, 1998
56
Uniformity improvement in dc magnetron sputtering deposition on a large area substrate
T Seino
,
Y Kawakubo
,
K Nakajima
,
M Kamei
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 697 KB
Your tags:
english, 1998
57
Advanced plasma processing techniques for metallization in giga scale technology
G.A Dixit
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 1.13 MB
Your tags:
english, 1998
58
Optimization of sputtering conditions for protective carbon thin films of rigid disks deposited by FTS
K Noda
,
T Kawanabe
,
T Hirata
,
M Naoe
Journal:
Vacuum
Year:
1998
Language:
english
File:
PDF, 692 KB
Your tags:
english, 1998
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