HF-Last Wet Clean in Combination with a Low Temperature...

Solid State Phenomena 2014 / 9 Vol. 219

HF-Last Wet Clean in Combination with a Low Temperature GeH4-Assisted HCl In Situ Clean Prior to Si0.8Ge0.2-on-Si Epitaxial Growth

Wostyn, Kurt, Dhayalan, Sathish K., Hikavyy, Andriy, Loo, Roger, Douhard, Bastien, Moussa, Alain, Rondas, Dirk, Kenis, Karine, Mertens, Paul W., Holsteyns, Frank, De Gendt, Stefan, Profijt, Harald B.
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Volume:
219
Language:
english
Journal:
Solid State Phenomena
DOI:
10.4028/www.scientific.net/ssp.219.20
Date:
September, 2014
File:
PDF, 492 KB
english, 2014
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