(Invited) Technology Options to Reduce Contact Resistance...

ECS Transactions 2015 / 05 Vol. 66; Iss. 4

(Invited) Technology Options to Reduce Contact Resistance in Nanoscale III-V MOSFETs

Lee, R. T. P., Loh, W. Y., Tieckelmann, R., Orzali, T., Huffman, C., Vert, A., Huang, G., Kelman, M., Karim, Z., Hobbs, C., Hill, R. J. W., Papa Rao, S. S.
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Volume:
66
Language:
english
Journal:
ECS Transactions
DOI:
10.1149/06604.0125ecst
Date:
May, 2015
File:
PDF, 663 KB
english, 2015
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