Large scale three-dimensional simulations for thick SU-8...

Microelectronic Engineering 2014 / 07 Vol. 123

Large scale three-dimensional simulations for thick SU-8 lithography process based on a full hash fast marching method

Zhou, Zai-Fa, Shi, Li-Li, Zhang, Heng, Huang, Qing-An
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Volume:
123
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2014.07.023
Date:
July, 2014
File:
PDF, 793 KB
english, 2014
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