Volume 123

Microelectronic Engineering

Volume 123

1

A scalable anti-sticking layer process via controlled evaporation

Steinberg, Christian, Dhima, Khalid, Blenskens, Daniel, Mayer, Andre, Wang, Si, Papenheim, Marc, Scheer, Hella-Christin, Zajadacz, Joachim, Zimmer, Klaus

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 865 KB

english, 2014

2

At low costs: Study on optical propagation losses of silicon waveguides fabricated by electron beam lithography

Bolten, Jens, Manecke, Christel, Wahlbrink, Thorsten, Waldow, Michael, Kurz, Heinrich

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 459 KB

english, 2014

3

Alignment verification for electron beam lithography

Thoms, Stephen, Macintyre, Douglas S., Docherty, Kevin E., Weaver, John M.R.

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 804 KB

english, 2014

4

Alternative emitter substrates for Ionic Liquid Ion Source implementation in focused ion beams

Perez-Martinez, Carla, Rojas-Herrera, Jimmy, Lozano, Paulo C.

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 1.12 MB

english, 2014

5

Anti-sticking layers for nickel-based nanoreplication tools

Padeste, Celestino, Bellini, Sandro, Siewert, Dorota, Schift, Helmut

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 879 KB

english, 2014

6

Subwavelength imaging of self-assembled triangular array through a silver superlens

Liu, Jia, Xia, Wei, Zhang, Shouqiang, Dong, Qiming, Guo, Xiaowei, Zhang, Zhiyou

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 1.36 MB

english, 2014

7

Roll-to-roll nanoimprint lithography for patterning on a large-area substrate roll

Lim, Hyungjun, Choi, Kee-bong, Kim, Geehong, Lee, Sunghwi, Park, Hyunha, Ryu, Jihyeong, Jung, Sanghee, Lee, Jaejong

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 2.51 MB

english, 2014

8

Super resolution technique for sub-100nm nanoimprint mold via mechanical deformation method

Miebori, Toru, Unno, Noriyuki, Taniguchi, Jun

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 1.38 MB

english, 2014

9

Realization of ultra-thin HSQ resist layer for high resolution electron beam lithography using liquid splitting process

Kim, Jung Wuk, Bolten, Jens, Moormann, Christian, Kurz, Heinrich

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 790 KB

english, 2014

10

Preparation of fluoropolymer structures for orthogonal processing of diverse material by Micro-Contact Printing

Kim, Myoung-Soo, Lee, Da-Hyeok, Cha, Young-Hwan, Kim, Ki-Bo, Jung, Seok-Heon, Lee, Jin-Kyun, O, Beom-Hoan, Lee, Seung-Gol, Park, Se-Geun

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 1.31 MB

english, 2014

11

A novel template-release method for low-defect nanoimprint lithography

Kitagawa, Takuya, Nakamura, Naoto, Kawata, Hiroaki, Hirai, Yoshihiko

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 3.13 MB

english, 2014

12

Screen-offset printing for fine conductive patterns

Nomura, Ken-ichi, Ushijima, Hirobumi, Mitsui, Ryosuke, Takahashi, Seiya, Nakajima, Shin-ichiro

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 1.47 MB

english, 2014

13

Simulation of the template release process based on fracture mechanics in nanoimprint lithography

Shiotsu, Takahiro, Uemura, Kimiaki, Tochino, Takamitsu, Ooi, Shuuya, Onishi, Yuuki, Yasuda, Masaaki, Kawata, Hiroaki, Kobayashi, Takuya, Hirai, Yoshihiko

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 2.30 MB

english, 2014

14

Ordering of 6-nm-sized nanodot arrays with 10-nm-pitch using self-assembled block copolymers along electron beam-drawn guide-lines

Hosaka, Sumio, Akahane, Takashi, Huda, Miftakhul, Komori, Takuya, Zhang, Hui, Yin, You

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 819 KB

english, 2014

15

Nanoscale metal pattern-transfer technique using silver ink

Wakamatsu, Ryuichi, Taniguchi, Jun

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 2.12 MB

english, 2014

16

Competitiveness of negative tone resists for nanoimprint lithography

Dhima, Khalid, Steinberg, Christian, Mayer, Andre, Wang, Si, Papenheim, Marc, Scheer, Hella-Christin

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 1.18 MB

english, 2014

17

Model-based breakdown of resist and mask contributions to local CDU for sub-30-nm contact holes in EUV lithography

Kim, Insung, Park, Changmin, Hwang, Myeongsu, Yeo, Jeong-Ho, Hahn, Jae W.

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 1.61 MB

english, 2014

18

The focusing performance of an aperiodic double layer metallic grating

Ma, Long, Lin, Jie, Jin, Peng, Prewett, Phil, Lu, Zhengang, Tan, Jiubin

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 1.34 MB

english, 2014

19

Modeling the edge-placement yield of a cut process for self-aligned multiple patterning

Zhang, Pan, Chen, Yijian

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 2.96 MB

english, 2014

20

Focus position and depth of two-dimensional patterning by Talbot effect lithography

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 795 KB

english, 2014

21

Photo-curable resists for inkjet dispensing applied in large area and high throughput roll-to-roll nanoimprint processes

Thesen, M.W., Ruttloff, S., Limberg, R.P.F., Vogler, M., Nees, D., Grützner, G.

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 914 KB

english, 2014

22

Multi-electron-beam deflector array

Zonnevylle, A.C., Heerkens, C.Th.H., Hagen, C.W., Kruit, P.

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 3.44 MB

english, 2014

23

Development of release agent-free replica mould material for ultraviolet nanoimprinting

Otsuka, Yuma, Hiwasa, Shin, Taniguchi, Jun

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 2.01 MB

english, 2014

24

Characterisation of a novel electron beam lithography resist, SML and its comparison to PMMA and ZEP resists

Gangnaik, Anushka, Georgiev, Yordan M., McCarthy, Brendan, Petkov, Nikolay, Djara, Vladimir, Holmes, Justin D.

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 1.03 MB

english, 2014

25

Nanoimprinted DWDM laser arrays on indium phosphide substrates

Smistrup, Kristian, Nørregaard, Jesper, Mironov, Andrej, Bro, Tobias H., Bilenberg, Brian, Nielsen, Theodor, Eriksen, Johan, Thilsted, Anil H., Hansen, Ole, Kristensen, Anders, Rishton, Stephen, Khan,

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 1001 KB

english, 2014

26

28nm pitch of line/space pattern transfer into silicon substrates with chemo-epitaxy Directed Self-Assembly (DSA) process flow

Chan, Boon Teik, Tahara, Shigeru, Parnell, Doni, Rincon Delgadillo, Paulina A., Gronheid, Roel, de Marneffe, Jean-François, Xu, Kaidong, Nishimura, Eiichi, Boullart, Werner

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 2.04 MB

english, 2014

27

Computer generated hologram-ROM fabrication and duplication by EBL and UV-NIL

Ogino, Keito, Unno, Noriyuki, Yoshida, Shuhei, Yamamoto, Manabu, Taniguchi, Jun

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 1.12 MB

english, 2014

28

Modelling slip flow in micro/nano gaps with moving boundary

Chen, Hui, Fu, Xin, Liu, Qi

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 957 KB

english, 2014

29

High throughput grating qualification of directed self-assembly patterns using optical metrology

Van Look, Lieve, Rincon Delgadillo, Paulina, Lee, Yu-tsung, Pollentier, Ivan, Gronheid, Roel, Cao, Yi, Lin, Guanyang, Nealey, Paul F.

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 1.22 MB

english, 2014

30

Defect analysis and lifetime evaluation of a release-coated nanoimprint mold

Okada, Masanori, Yamashita, Daisuke, Unno, Noriyuki, Taniguchi, Jun

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 1.35 MB

english, 2014

31

Proxy delta lithography method: Improving pattern fidelity and exposure dose effectiveness of spatial light modulation based lithography

Kim, Haeryung, Seo, Manseung

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 1.12 MB

english, 2014

32

Study of air bubble generation and its minimization during dispensing based ultraviolet nanoimprint lithography (UV-NIL)

Ryu, JiHyeong, Lee, Sang-Ho, Lim, HyungJun, Park, Hyun-Ha, Lee, JaeJong

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 1.35 MB

english, 2014

33

Molecular orientation of a photoreactive liquid crystalline polymer induced by thermal nanoimprinting and graphoepitaxy

Okada, Makoto, Hosoda, Risa, Kondo, Mizuho, Haruyama, Yuichi, Sasaki, Tomoyuki, Ono, Hiroshi, Kawatsuki, Nobuhiro, Matsui, Shinji

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 764 KB

english, 2014

34

Solid immersion interference lithography with conformable phase mask

Lin, Chun-Hung, Lin, Yu-Chu, Liang, Chia-Ching

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 1.20 MB

english, 2014

35

Inside Front Cover - Editorial Board

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 29 KB

english, 2014

36

Table of Contents

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 131 KB

english, 2014

37

Author Index

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 151 KB

english, 2014

38

Large scale three-dimensional simulations for thick SU-8 lithography process based on a full hash fast marching method

Zhou, Zai-Fa, Shi, Li-Li, Zhang, Heng, Huang, Qing-An

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 793 KB

english, 2014

39

Measurements of flow distribution in a thin resin layer during ultraviolet nanoimprint lithography by means of digital holographic particle-tracking velocimetry

Unno, Noriyuki, Satake, Shin-ichi, Taniguchi, Jun

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 1.47 MB

english, 2014

40

Special issue on Nano Lithography 2013

Prewett, Philip, Durrani, Zahid

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 163 KB

english, 2014

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