Probing the limits of optical lithography: The fabrication...

Microelectronic Engineering 2000 Vol. 53; Iss. 1-4

Probing the limits of optical lithography: The fabrication of sub-100nm devices with 193nm wavelength lithography

R.A. Cirelli, J. Bude, F. Houlihan, A. Gabor, G.P. Watson, G.R. Weber, F.P. Klemens, J. Sweeney, W.M. Mansfield, O. Nalamasu
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Volume:
53
Year:
2000
Language:
english
Pages:
4
DOI:
10.1016/s0167-9317(00)00270-7
File:
PDF, 721 KB
english, 2000
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