Volume 53; Issue 1-4

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Microelectronic Engineering
Volume 53; Issue 1-4

Microelectronic Engineering

Volume 53; Issue 1-4

1

Preface to the Micro and Nano Engineering 1999 proceedings publication

Massimo Gentili, Enzo Di Fabrizio, Giancarlo Meneghini

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 70 KB

english, 2000

2

Image formation in EUV lithography: Multilayer and resist properties

F. Cerrina, S. Bollepalli, M. Khan, H. Solak, W. Li, D. He

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 1.40 MB

english, 2000

3

Ion Projection Lithography: Progress of European MEDEA & International Program

Rainer Kaesmaier, Hans Löschner

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 3.06 MB

english, 2000

4

MEMS: Quo vadis in century XXI?

Richard S. Muller

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 679 KB

english, 2000

5

Prospects for charged particle lithography as a manufacturing technology

R. Fabian Pease, Liqun Han, Gil I. Winograd, W.D. Meisburger, Dan Pickard, M.A. McCord

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 916 KB

english, 2000

6

PREVAIL: Proof-of-Concept system and results

Hans C. Pfeiffer

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 2.18 MB

english, 2000

7

Fabrication of patterned media for high density magnetic storage

C.A. Ross, Henry I. Smith, T. Savas, M. Schattenburg, M. Farhoud, M. Hwang, M. Walsh, M.C. Abraham, R.J. Ram

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 43 KB

english, 2000

8

High-performance and damage-free plasma etching processes for future ULSI patterning

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 628 KB

english, 2000

9

Probing the limits of optical lithography: The fabrication of sub-100nm devices with 193nm wavelength lithography

R.A. Cirelli, J. Bude, F. Houlihan, A. Gabor, G.P. Watson, G.R. Weber, F.P. Klemens, J. Sweeney, W.M. Mansfield, O. Nalamasu

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 721 KB

english, 2000

10

CD dispersion across the lens field: Influence on transistor characteristics

O. Toublan, P. Schiavone, R. Gwoziecki, D. Boutin

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 591 KB

english, 2000

11

Deep-ultraviolet contact photolithography

James G. Goodberlet, Bryan L. Dunn

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 898 KB

english, 2000

12

A 2 million transistor digital processor with 120 nm gates fabricated by 248 nm wavelength phase shift technology

G.P. Watson, I.C. Kizilyalli, M. Miller, Y.T. Wang, B. Pati, R.A. Cirelli, O. Nalamasu, J. Radosevich, R. Kohler, R. Freyman, F. Baumann, F. Klemens, W. Mansfield, H. Vaidya, J. Frackoviak, A. Timko,

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 770 KB

english, 2000

13

Wide band gap fluoride dielectric crystals doped with trivalent rare earth ions as optical materials for 157 nm photolithography

E. Sarantopoulou, Z. Kollia, A.C. Cefalas

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 311 KB

english, 2000

14

248 nm Lithography for 180 nm contact holes

C. Romeo, A. Fiorino, P. Canestrari

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 1.37 MB

english, 2000

15

Sub-wavelength printing using multiple overlapping masks

S. Pau, O. Nalamasu, R. Cirelli, J. Frackoviak, A. Timko, G.P. Watson, F. Klemens, G. Timp

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 1.18 MB

english, 2000

16

AlSixNy as an embedded layer for attenuated phase-shifting mask in 193 nm and the utilization of a chemically amplified negative resist NEB-22 for maskmaking

Wen-an Loong, Cheng-ming Lin

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 342 KB

english, 2000

17

Influence of wafer chucking on focus margin for resolving fine patterns in optical lithography

A. Une, Y. Kai, M. Mochida, S. Matsui, F. Ohira

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 899 KB

english, 2000

18

A novel bottom antireflective coating working for both KrF and ArF excimer laser lithography

L.A. Wang, H.L. Chen

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 199 KB

english, 2000

19

Maximising the process window in sub-half-micron optical lithography

G. Arthur, B. Martin, C. Wallace

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 258 KB

english, 2000

20

Excimer lasers for 0.1 μm lithography and beyond

K. Vogler, U. Stamm, R. Pätzel, I. Tassy, I. Bragin, R. Osmanov, S. Govorkov, J. Kleinschmidt, T Schroeder, F. Voß, D. Basting

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 289 KB

english, 2000

21

Optical proximity correction by grey tone photolithography

Zheng Cui, Jinglei Du, Qizhong Huang, Jingqin Su, Yongkang Guo

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 1.34 MB

english, 2000

22

Process development for 30 nm poly gate patterning on 1.2 nm oxide

M. Heitzmann, M.E. Nier

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 1.63 MB

english, 2000

23

Fabrication of high density nanostructures gratings (>500Gbit/in2) used as molds for nanoimprint lithography

F. Carcenac, C. Vieu, A. Lebib, Y. Chen, L. Manin-Ferlazzo, H. Launois

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 1.45 MB

english, 2000

24

Nanoreplication in polymers using hot embossing and injection molding

H. Schift, C. David, M. Gabriel, J. Gobrecht, L.J. Heyderman, W. Kaiser, S. Köppel, L. Scandella

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 702 KB

english, 2000

25

Tri-layer systems for nanoimprint lithography with an improved process latitude

A. Lebib, Y. Chen, F. Carcenac, E. Cambril, L. Manin, L. Couraud, H. Launois

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 1.11 MB

english, 2000

26

Fabrication and characterization of vacuum nanoelectronic devices

A.A.G. Driskill-Smith, D.G. Hasko, H. Ahmed

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 707 KB

english, 2000

27

High resolution magnetic patterning using Focused Ion Beam irradiation

C. Vieu, J. Gierak, H. Launois, T. Aign, P. Meyer, J.P. Jamet, J. Ferré, C. Chappert, V. Mathet, H. Bernas

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 649 KB

english, 2000

28

Coulomb blockade in a silicon-on-sapphire nanowire

D. Dovinos, D.G. Hasko, Z. Helin

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 480 KB

english, 2000

29

Inverted modulation-doped n-type Si/Si0.77Ge0.23 heterostructures

R.B. Dunford, A. Ahmed, D.J. Paul, M. Pepper, A.C. Churchill, D.J. Robbins, A.J. Pidduck

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 528 KB

english, 2000

30

1/f-Noise of sub-100 nm-MOS-transistors fabricated by a special deposition and etchback technique

J.T. Horstmann, U. Hilleringmann, K. Goser

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 379 KB

english, 2000

31

Nanofabrication of quantum wires on (100) Si and SiGe by shifted-resist pattern and anisotropic wet etching

E. Giovine, E. Cianci, V. Foglietti, A. Notargiacomo, F. Evangelisti

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 769 KB

english, 2000

32

Combination of nanoimprint and scanning force lithography for local tailoring of sidewalls of nanometer devices

H. Schulz, A.S. Körbes, H.-C. Scheer, L.J. Balk

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 1.11 MB

english, 2000

33

Fabrication of metallic multilayer single electron tunneling devices using low-energy e-beam lithography

Th. Weimann, H. Scherer, P. Hinze, J. Niemeyer

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 1.22 MB

english, 2000

34

Parallel frequency readout of an array of mass-sensitive transducers for sensor applications

B.H. Kim, M. Maute, F.E. Prins, D.P. Kern, M. Croitoru, S. Raible, U. Weimar, W. Göpel

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 505 KB

english, 2000

35

Fabrication of nanostructures using a UV-based imprint technique

M. Bender, M. Otto, B. Hadam, B. Vratzov, B. Spangenberg, H. Kurz

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 888 KB

english, 2000

36

70 nm Features on 140 nm period using evanescent near field optical lithography

M.M. Alkaisi, R.J. Blaikie, S.J. McNab

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 1.18 MB

english, 2000

37

Temporal cross-section for carrier capture by self-assembled quantum dots

S. Raymond, S. Fafard, K. Hinzer, S. Charbonneau, J.L. Merz

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 299 KB

english, 2000

38

Self-organized quantum dot formation by ion sputtering

S. Facsko, T. Dekorsy, C. Trappe, H. Kurz

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 952 KB

english, 2000

39

A sub-micron photoluminescence system for nanostructure characterization

M. De Vittorio, C. Turco, R. Rinaldi, A. Melcarne, R. Cingolani

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 561 KB

english, 2000

40

Microcontact printing and pattern transfer with a tri-layer processing

Y. Chen, A. Lebib, F. Carcenac, H. Launois, G. Schmidt, M. Tormen, G. Müller, L.W. Molenkamp, M. Liebau, J. Huskens, S.N. Reinhoudl

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 953 KB

english, 2000

41

Imaging of Si nano-patterns embedded in SiO2 using scanning electron microscopy

M. Nagase, K. Kurihara

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 1.20 MB

english, 2000

42

Electron beam induced deposition of metallic tips and wires for microelectronics applications

I. Utke, B. Dwir, K. Leifer, F. Cicoira, P. Doppelt, P. Hoffmann, E. Kapon

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 1.69 MB

english, 2000

43

Fabrication of MOS-integrated metallic single electron memories

A. Pépin, C. Vieu, H. Launois, M. Rosmeulen, M. Van Rossum, H.O. Mueller, D. Williams, H. Mizuta, K. Nakazato

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 554 KB

english, 2000

44

Experimental evaluation of arrayed microcolumn lithography

L.P. Muray, K.Y. Lee, J.P. Spallas, M. Mankos, Y. Hsu, M.R. Gmur, H.S. Gross, C.B. Stebler, T.H.P. Chang

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 1.81 MB

english, 2000

45

An experimental setup to test the MAPPER electron lithography concept

B.J. Kampherbeek, M.J. Wieland, A. van Zuuk, P. Kruit

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 752 KB

english, 2000

46

PREVAIL — Evolution and properties of large area reduction projection electron optics

W. Stickel, G.O. Langner

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 351 KB

english, 2000

47

A study of multiple scattering effect with 10 kV e-beam system

Chan-Uk Jeon, Ji-Hyeon Choi, Byung-Gook Kim, Seong-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 589 KB

english, 2000

48

Electron-beam lithography of V-groove quantum wire devices

B. Dwir, I. Utke, D. Kaufman, E. Kapon

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 1.43 MB

english, 2000

49

Global space charge effect in SCALPEL

M. Mkrtchyan, E. Munro, J.A. Liddle, S.T. Stanton, W.K. Waskiewicz, R.C. Farrow, V. Katsap

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 376 KB

english, 2000

50

Marks for SCALPEL® tool optics optimization

R.C. Farrow, G.M. Gallatin, W.K. Waskiewicz, J.A. Liddle, I. Kizilyalli, A. Kornblit, C. Biddick, M. Blakey, F. Klemens, J. Felker, J. Kraus, M. Mkrtchyan, P.A. Orphanos, N. Layadi, S. Merchant

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 289 KB

english, 2000

51

Analysis of a SCALPEL™ multi-pass writing strategy

X. Zhu, E. Munro, J.A. Rouse, H. Liu, W.K. Waskiewicz

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 486 KB

english, 2000

52

A simple new method for the investigation of process latitude in E-beam lithography with positive resists

V.A. Kudryashov, P.D. Prewett, A.G. Michette

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 704 KB

english, 2000

53

Optimum energy for high resolution low voltage electron beam lithography — Monte Carlo simulations and experiments

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 581 KB

english, 2000

54

Resist heating with different writing strategies for high-throughput maskmaking

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 1.20 MB

english, 2000

55

Comparison of PEC approaches for SCALPEL

Stuart Stanton, Anja Rosenbusch

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 505 KB

english, 2000

56

A study of electron forward scattering effects on the footwidth of T-gates fabricated using a bilayer of PMMA and UVIII

Y. Chen, D. Macintyre, S. Thoms

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 952 KB

english, 2000

57

Influence of electron acceleration voltage in the cell-projection lithography system

M. Kotera, K. Yamaguchi, M. Sakai, K. Naruse, T. Okagawa, K. Matsuoka, Y Kojima, M. Yamabe

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 296 KB

english, 2000

58

Thermal distortion predictions of a silicon wafer during exposure in a SCALPEL tool

S. Gianoulakis, J. Liddle, S. Stanton, G. Gallatin

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 344 KB

english, 2000

59

Improved pattern-placement accuracy in e-beam lithography via sparse-sample spatial-phase locking

J.T. Hastings, F. Zhang, J.G. Goodberlet, Henry Smith

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 793 KB

english, 2000

60

Etch characteristics of giant magnetoresistive materials

D.J. Resnick, S. Pendharkar, K. Kyler, G. Kerszykowski, S. Clemens, H. Tompkins, M. Durlam, S. Tehrani

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 872 KB

english, 2000

61

Quantum electron beam probe of sidewall dry-etch damage

M. Rahman, J.G. Williamson, K. Mathieson, G. Dick, M.J. Brown, S. Duffy, C.D.W. Wilkinson

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 498 KB

english, 2000

62

SiO2/Si selectivity in high density CHF3/CH4 plasmas: Role of the fluorocarbon layer

L. Rolland, M.C. Peignon, Ch. Cardinaud, G. Turban

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 351 KB

english, 2000

63

Resist removal process in dual damascene structure integrating Cu and SiLK® for 0.18 μm technology

D. Louis, C. Arvet, E. Lajoinie, C. Peyne, S. Lee, I. Berry, Q. Han

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 874 KB

english, 2000

64

Synthesis of silicide structures by high energy ion projection

U. Weidenmüller, J. Meijer, P. Baving, H. Röcken, H.H. Bukow, C. Rolfs

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 1.01 MB

english, 2000

65

Nanopatterning of organic and inorganic materials by holographic lithography and plasma etching

P. Visconti, C. Turco, R. Rinaldi, R. Cingolani

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 1.03 MB

english, 2000

66

Low temperature Electron Cyclotron Resonance plasma technique for low loss integrated optics

P.L. Pernas, E. Ruíz, M.J. Hernández, J. Garrido, B.J. García, J.L. Castan˜o, J.M. Requejo, J. Solís, R. Serna, C.N. Afonso, J. Piqueras

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 512 KB

english, 2000

67

Novel linear and crosslinking polymers for nanoimprinting with high etch resistance

K. Pfeiffer, M. Fink, G. Bleidiessel, G. Gruetzner, H. Schulz, H.-C. Scheer, T. Hoffmann, C.M. Sotomayor Torres, F. Gaboriau, Ch. Cardinaud

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 861 KB

english, 2000

68

Beam-assisted-etching technique for fabrication of single crystal diamond field emitter tip

J. Taniguchi, J. Yokoyama, M. Komuro, H. Hiroshima, I. Miyamoto

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 773 KB

english, 2000

69

Fabrication of nanostructures in GaN

B. Rong, R. Cheung, W. Gao, M. Kamp

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 895 KB

english, 2000

70

A triphenylene derivative as a novel negative/positive tone resist of 10 nanometer resolution

T. Tada, T. Kanayama, A.P.G. Robinson, R.E. Palmer, M.T. Allen, J.A. Preece, K.D.M. Harris

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 601 KB

english, 2000

71

Minimizing thick resist sidewall slope dependence on design geometry by optimizing bake conditions

H. Puchner, R. Castagnetti, W. Pyka

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 1.98 MB

english, 2000

72

Optimization of an advanced positive tone DUV photoresist towards 150 nm and beyond

M. Ercken, M. Moelants, G. Vandenberghe, M. Goethals, K. Ronse, S. Masuda, W. Spiess, G. Pawlowski

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 1.90 MB

english, 2000

73

Aqueous base developable epoxy resist for high sensitivity electron beam lithography

P. Argitis, N. Glezos, M. Vasilopoulou, I. Raptis, M. Hatzakis, J. Everett, G. Meneghini, A. Palumbo, M. Ardito, P. Hudek, I. Kostic

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 1.68 MB

english, 2000

74

Bias printing of APSM resists for 180 nm contact holes

G. Teng, G. Prokopowicz, D. Kang, C. Xu, J. Thackeray, T. Duong, G. Orsula

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 915 KB

english, 2000

75

Comparison of negative tone resists NEB22 and UVN30 in e-beam lithography

A.J. van Dodewaard, W.S.M.M. Ketelaars, R.F.M. Roes, J.A.J. Kwinten, F.C.M.J.M. van Delft, A.J. van Run, A.K. van Langen-Suurling, J. Romijn

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 596 KB

english, 2000

76

157nm photodissociation of polyamides

A.C. Cefalas, E. Sarantopoulou

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 359 KB

english, 2000

77

Highly sensitive positive surface modification resists

M. Shirai, M. Endo, M. Tsunooka, M. Endo

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 422 KB

english, 2000

78

Development mechanism study by dissolution monitoring of positive methacrylate photoresists

I. Raptis, D. Velessiotis, M. Vasilopoulou, P. Argitis

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 404 KB

english, 2000

79

Application of Calixarene for nanometer magnetic particle fabrication

P. Jedrasik, M. Hanson, B. Nilsson

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 1.50 MB

english, 2000

80

Fabrication of a micromachined magnetic X/Y/Z scanner for parallel scanning probe applications

H. Rothuizen, U. Drechsler, G. Genolet, W. Häberle, M. Lutwyche, R. Stutz, R. Widmer, P. Vettiger

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 1.21 MB

english, 2000

81

Micro-technology for anti- counterfeiting

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 1.46 MB

english, 2000

82

Nanoimprint- and UV-lithography: Mix&Match process for fabrication of interdigitated nanobiosensors

L. Montelius, B. Heidari, M. Graczyk, I. Maximov, E-L. Sarwe, T.G.I. Ling

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 894 KB

english, 2000

83

A novel insulation technique for smart power switching devices and very high voltage ICs above 10 kV

V. Mankowski, U. Hilleringmann, K. Schumacher

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 696 KB

english, 2000

84

Coding gray-tone mask for refractive microlens fabrication

Jun Yao, Jingqin Su, Jinglei Du, Yixiao Zhang, Fuhua Gao, Feng Gao, Yongkang Guo, Zheng Cui

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 991 KB

english, 2000

85

A new lithography technique using super-resolution near-field structure

M. Kuwahara, T. Nakano, J. Tominaga, M.B. Lee, N. Atoda

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 802 KB

english, 2000

86

Three-dimensional microstructure elements fabricated by electron beam lithography and dry etching technique

R. Steingrüber, M. Ferstl

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 1.47 MB

english, 2000

87

Micromachined silicon grisms: high resolution spectroscopy in the near infrared

E. Cianci, V. Foglietti, F. Vitali, D. Lorenzetti, A. Notargiacomo, E. Giovine

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 1.14 MB

english, 2000

88

Microstructures etched in doped TMAH solutions

S. Brida, A. Faes, V. Guarnieri, F. Giacomozzi, B. Margesin, M. Paranjape, G.U. Pignatel, M. Zen

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 961 KB

english, 2000

89

Submicron semiconductor structure for microwave detection

S. Asˇmontas, J. Gradauskas, A. Sužiedėlis, G. Valusˇis

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 577 KB

english, 2000

90

Replication of 3D-micro- and nanostructures using different UV-curable polymers

St. Rudschuck, D. Hirsch, K. Zimmer, K. Otte, A. Braun, R. Mehnert, F. Bigl

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 265 KB

english, 2000

91

A micromachined Xenon flow regulator for space applications

A. Diligenti, A. Nannini, F. Pieri, M. Piotto, G. Noci

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 412 KB

english, 2000

92

A silicon microfabricated electrostatic transducer: 1 MHz transmission in air and in water

G. Caliano, V. Foglietti, E. Cianci, M. Pappalardo

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 584 KB

english, 2000

93

Flexible, reliable and simple fabrication of integrated spot size converters with shifting mask technique

R. Steingrüber, D. Trommer, R. Kaiser, K. Pfeiffer, I. Tiedke

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 569 KB

english, 2000

94

High-value MOS capacitor arrays in ultradeep trenches in silicon

F. Roozeboom, R. Elfrink, J. Verhoeven, J. van den Meerakher, F. Holthuysen

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 1.61 MB

english, 2000

95

Using X-ray Lithography to make sub 100 nm MMICs

Robert (Bob) Selzer, John Heaton

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 1.88 MB

english, 2000

96

Fine pattern fabrication of α-type Ta on a membrane for X-ray mask absorber using ECR ion stream etching

T. Tsuchizawa, C. Takahashi, M. Shimada, S. Uchiyama, T. Ono, M. Oda

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 852 KB

english, 2000

97

3D microstructures fabricated by partially opaque X-ray lithography masks

S. Cabrini, M. Gentili, E. Di Fabrizio, A. Gerardino, A. Nottola, Q. Leonard, L. Mastrogiacomo

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 1.23 MB

english, 2000

98

Comparison of experimental and Monte Carlo results of stochastic Coulomb interaction in projection beam lithography

P.W.H. de Jager, B. Mertens, E. Munro, E. Cekan, G. Lammer, H. Vonach, H. Buschbeck, M. Zeininger, C. Horner, H. Löschner, G. Stengl, A.J. Bleeker

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 878 KB

english, 2000

99

Electroabsorption in a GaAs n-i-p-i structure with selective contacts fabricated by Focused Ion Molecular Beam Epitaxy

S. Vijendran, G.A.C. Jones, H.E. Beere, A.J. Shields

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 562 KB

english, 2000

100

Application of scanning probe microscopy for the determination of the structural accuracy of high aspect ratio microstructures

S. Achenbach, J. Mohr, F.J. Pantenburg

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 677 KB

english, 2000

101

Multilayer integrated-circuit imaging with contrast enhancement in a large-area, high-resolution electron-beam system

D.J. Weaver, J.R.A. Cleaver, L. Avery, H. Ahmed

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 1.84 MB

english, 2000

102

High resolution and high sensitivity near-field optical microscope

J.M. Freyland, R. Eckert, H. Heinzelmann

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 662 KB

english, 2000

103

A proposal of high power EUV lithography illumination system using synchrotron radiation

Y. Gomei, ASET Association of Super-Advanced Electronics Technologies

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 296 KB

english, 2000

104

A liquid-xenon-jet laser-plasma x-ray and EUV source

B.A.M. Hansson, L. Rymell, M. Berglund, H.M. Hertz

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 275 KB

english, 2000

105

Theoretical estimation of absorption coefficients of various polymers at 13 nm

Nobuyuki N. Matsuzawa, Hiroaki Oizumi, Shigeyasu Mori, Shigeo Irie, Ei Yano, Shinji Okazaki, Akihiko Ishitani

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 309 KB

english, 2000

106

Comparison of Extreme Ultraviolet Sources for Lithography Applications

V.Y. Banine, J.P.H. Benschop, H.G.C. Werij

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 362 KB

english, 2000

107

Nanostructuring of zone plates for helium atom beam focusing

S. Rehbein, R.B. Doak, R.E. Grisenti, G. Schmahl, J.P. Toennies, Ch. Wöll

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 1.09 MB

english, 2000

108

Author index volume 53

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 979 KB

english, 2000

109

Editorial Board

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 57 KB

english, 2000

110

System-On-Chip: A way around lithography limitations

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 970 KB

english, 2000

111

Photon confinement effects — from physics to applications

A. Forchel, M. Kamp, T. Happ, J.P. Reithmaier, M. Bayer, J. Koeth, R. Dietrich

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 845 KB

english, 2000

112

Advanced mesoscopic device concepts and technology

Hideki Hasegawa

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 1.21 MB

english, 2000

113

Soft x-rays for deep sub-100 nm lithography, with and without masks

Henry I. Smith, D.J.D. Carter, M. Meinhold, E.E. Moon, M.H. Lim, J. Ferrera, M. Walsh, D. Gil, R. Menon

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 1.59 MB

english, 2000

114

Determining mask effects in low k1 lithography

Martin McCallum, Ron Gordon

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 418 KB

english, 2000

115

Absorbance and outgasing of photoresist polymeric materials for UV lithography below 193 nm including 157 nm lithography

A.C. Cefalas, E. Sarantopoulou, E. Gogolides, P. Argitis

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 288 KB

english, 2000

116

High order lens aberration monitor

J. Preuninger, S. Bukofsky, G. Kunkel

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 900 KB

english, 2000

117

Fabrication of Single Electron Devices by hybrid (E-beam/DUV) lithography

L. Palun, S. Tedesco, M. Heitzman, F. Martin, D. Fraboulet, B. Dal'zotto, M.E. Nier, P. Mur, T. Charvolin, D. Mariolle, F. Tardif

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 1.71 MB

english, 2000

118

Multifunctional AFM/SNOM cantilever probes: Fabrication and measurements

M. Stopka, D. Drews, K. Mayr, M. Lacher, W. Ehrfeld, T. Kalkbrenner, M. Graf, V. Sandoghdar, J. Mlynek

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 898 KB

english, 2000

119

Direct electron beam writing of nanostructures using passivated gold clusters

T.R. Bedson, P.D. Nellist, R.E. Palmer, J.P. Wilcoxon

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 1.18 MB

english, 2000

120

Capacitively- and resistively-coupled single-electron transistor

F. Wakaya, S. Mandai, S. Nakamichi, S. Iwabuchi, K. Gamo

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 780 KB

english, 2000

121

Si/Si1−xGex heterostructure field effect transistors fabricated using a low thermal budget CMOS process

R.B. Dunford, D.J. Paul, M. Pepper, B. Coonan, N. Griffin, G. Redmond, G.M. Crean, B. Holländer, S. Mantl

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 863 KB

english, 2000

122

Experimental and numerical investigations of photomask substrate heating due to electron beam patterning

B. Shamoun, D. Trost

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 294 KB

english, 2000

123

Determination of proximity effect parameters and the shape bias parameter in electron beam lithography

Eunsung Seo, Bo Kyung Choi, Ohyun Kim

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 593 KB

english, 2000

124

Study of resist surface roughness in EB lithography

A. Yoshida, Y. Kojima, K. Matsuoka, Y. Tomo, I. Shimizu, M. Yamabe

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 1.12 MB

english, 2000

125

Application of neural network to enhancing accuracy of E-beam proximity effect correction

S.-Y. Lee, J. Laddha

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 325 KB

english, 2000

126

Fabrication of semi-continuous profile Diffractive Optical Elements for beam shaping by Electron Beam Lithography

A. Nottola, A. Gerardino, M. Gentili, E. Di Fabrizio, S. Cabrini, P. Melpignano, G. Rotaris

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 589 KB

english, 2000

127

Performance of new E-beam lithography system JBX-9300FS

H. Takemura, H. Ohki, H. Nakazawa, Y. Nakagawa, M. Isobe, Y. Ochiai, T. Ogura, M. Narihiro, T. Mogami

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 916 KB

english, 2000

128

SiO2 and Si etching in fluorocarbon plasmas: Coupling of a surface model with a profile evolution simulator

G. Kokkoris, E. Gogolides, A.G. Boudouvis

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 582 KB

english, 2000

129

Fabrication of sub-10nm Si-tip array coated with Si3N4 thin film for potential NSOM and liquid metal ion source applications

M.Y. Jung, D.W. Kim, S.S. Choi

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 1.69 MB

english, 2000

130

Resistless patterning of sub-micron structures by evaporation through nanostencils

J. Brugger, J.W. Berenschot, S. Kuiper, W. Nijdam, B. Otter, M. Elwenspoek

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 916 KB

english, 2000

131

Monte Carlo study of high performance resists for SCALPEL nanolithography

L.E. Ocola, W-Y. Li, R.J. Kasica, M.I. Blakey, P.A. Orphanos, W.K. Waskiewicz, A.E. Novembre, M. Sato

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 912 KB

english, 2000

132

Overview of the STORM program application to 193nm singe layer resists

E. Croffie, M. Cheng, A. Neureuther, R. Cirelli, F. Houlihan, J. Sweeney, P. Watson, O. Nalamasu, I. Rushkin, O. Dimov, A. Gabor

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 784 KB

english, 2000

133

Three-dimensional resist development simulation — Benchmarks and integration with lithography

W. Pyka, H. Kirchauer, S. Selberherr

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 482 KB

english, 2000

134

Characterisation of the ultrasonic development process in UVIII resist

Shazia Yasin, A. Mumtaz, D.G. Hasko, F. Carecenac, H. Ahmed

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 794 KB

english, 2000

135

Acid diffusion analysis in the chemically amplified CARL resist

E. Richter, S. Hien, M. Sebald

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 390 KB

english, 2000

136

High sensitive negative silylation process for 193nm lithography

M. Endo, I. Satou, H. Watanabe, H. Morimoto

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 842 KB

english, 2000

137

Use of SU-8 photoresist for very high aspect ratio x-ray lithography

A.L. Bogdanov, S.S. Peredkov

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 786 KB

english, 2000

138

High density fluorocarbon plasma etching of new resists suitable for nano-imprint lithography

F. Gaboriau, M.C. Peignon, A. Barreau, G. Turban, Ch. Cardinaud, K. Pfeiffer, G. Bleidießel, G. Grützner

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 667 KB

english, 2000

139

Fabrication of NMR — Microsensors for nanoliter sample volumes

J. Dechow, A. Forchel, T. Lanz, A. Haase

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 585 KB

english, 2000

140

A micromachined bistable 1×2 switch for optical fibers

F. Pieri, M. Piotto

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 917 KB

english, 2000

141

A structure definition technique for 25 nm lines of silicon and related materials

U. Hilleringmann, T. Vieregge, J.T. Horstmann

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 973 KB

english, 2000

142

Overlay performance of SR lithography in 64M DRAM layers

H. Sumitani, M. Suita, T. Hifumi, H. Watanabe, H. Yabe, K. Itoga, S. Aya, K. Marumoto, Y. Matsui

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 583 KB

english, 2000

143

Dry etch improvements in the SOI wafer flow process for IPL stencil mask fabrication

F. Letzkus, J. Butschke, B. Höfflinger, M. Irmscher, C. Reuter, R. Springer, A. Ehrmann, J. Mathuni

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 1.85 MB

english, 2000

144

Temperature and energy spread investigations of alloy LMIS

L. Bischoff, J. Teichert, S. Hausmann, T. Ganetsos, G.L.R. Mair

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 270 KB

english, 2000

145

Modeling pattern transfer in ion-beam lithography masks

G. Frisque, R. Tejeda, R. Engelstad, E. Lovell

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 1.35 MB

english, 2000

146

The birefringence and polarization effects of amorphous Ge and Si gratings by focused-ion-beam

Kyung Shin, Jin-Woo Kim, Jung-Il Park, Young-Jong Lee, Hyun-Yong Lee, Hong-Bay Chung

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 673 KB

english, 2000

147

X-ray nano-diffraction: 100 nm resolution obtained in a novel imaging technique for strain measurement at buried interfaces

S. Lagomarsino, S. Di Fonzo, W. Jark, C. Giannini, L. De Caro, A. Cedola

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 841 KB

english, 2000

148

Development of a secondary-electron detection system for high-speed high-sensitivity inspection SEM imaging

A. Takafuji, M. Nozoe, H. Shinada

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 557 KB

english, 2000

149

Mitigation of surface contamination from resist outgassing in EUV lithography

B.M. Mertens, B. van der Zwan, P.W.H. de Jager, M. Leenders, H.G.C. Werij, J.P.H. Benschop, A.J.J. van Dijsseldonk

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 318 KB

english, 2000

150

Fabrication of stair-case profiles with high aspect ratios for blazed diffractive optical elements

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 1.27 MB

english, 2000

151

Prediction of resolution using wet-develop type single layer and dry-development process for EUV lithography

Shigeyasu Mori, Shigeru Shirayone, Shigeo Irie, Nobuyuki Matsuzawa, Hiroaki Oizumi, Ei Yano, Shinji Okazaki, Atsushi Miyafuji, Takeo Watanabe, Hiroo Kinoshita, Tetsuya Oshio, Katsumi Sugisaki

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 502 KB

english, 2000

152

Ion projection lithography for resistless patterning of thin magnetic films

W.H. Bruenger, M. Torkler, C. Dzionk, B.D. Terris, L. Folks, D. Weller, H. Rothuizen, P. Vettiger, G. Stangl, W. Fallmann

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 466 KB

english, 2000