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Volume 53; Issue 1-4
Main
Microelectronic Engineering
Volume 53; Issue 1-4
Microelectronic Engineering
Volume 53; Issue 1-4
1
Preface to the Micro and Nano Engineering 1999 proceedings publication
Massimo Gentili
,
Enzo Di Fabrizio
,
Giancarlo Meneghini
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 70 KB
Your tags:
english, 2000
2
Image formation in EUV lithography: Multilayer and resist properties
F. Cerrina
,
S. Bollepalli
,
M. Khan
,
H. Solak
,
W. Li
,
D. He
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 1.40 MB
Your tags:
english, 2000
3
Ion Projection Lithography: Progress of European MEDEA & International Program
Rainer Kaesmaier
,
Hans Löschner
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 3.06 MB
Your tags:
english, 2000
4
MEMS: Quo vadis in century XXI?
Richard S. Muller
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 679 KB
Your tags:
english, 2000
5
Prospects for charged particle lithography as a manufacturing technology
R. Fabian Pease
,
Liqun Han
,
Gil I. Winograd
,
W.D. Meisburger
,
Dan Pickard
,
M.A. McCord
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 916 KB
Your tags:
english, 2000
6
PREVAIL: Proof-of-Concept system and results
Hans C. Pfeiffer
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 2.18 MB
Your tags:
english, 2000
7
Fabrication of patterned media for high density magnetic storage
C.A. Ross
,
Henry I. Smith
,
T. Savas
,
M. Schattenburg
,
M. Farhoud
,
M. Hwang
,
M. Walsh
,
M.C. Abraham
,
R.J. Ram
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 43 KB
Your tags:
english, 2000
8
High-performance and damage-free plasma etching processes for future ULSI patterning
Seiji Samukawa
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 628 KB
Your tags:
english, 2000
9
Probing the limits of optical lithography: The fabrication of sub-100nm devices with 193nm wavelength lithography
R.A. Cirelli
,
J. Bude
,
F. Houlihan
,
A. Gabor
,
G.P. Watson
,
G.R. Weber
,
F.P. Klemens
,
J. Sweeney
,
W.M. Mansfield
,
O. Nalamasu
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 721 KB
Your tags:
english, 2000
10
CD dispersion across the lens field: Influence on transistor characteristics
O. Toublan
,
P. Schiavone
,
R. Gwoziecki
,
D. Boutin
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 591 KB
Your tags:
english, 2000
11
Deep-ultraviolet contact photolithography
James G. Goodberlet
,
Bryan L. Dunn
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 898 KB
Your tags:
english, 2000
12
A 2 million transistor digital processor with 120 nm gates fabricated by 248 nm wavelength phase shift technology
G.P. Watson
,
I.C. Kizilyalli
,
M. Miller
,
Y.T. Wang
,
B. Pati
,
R.A. Cirelli
,
O. Nalamasu
,
J. Radosevich
,
R. Kohler
,
R. Freyman
,
F. Baumann
,
F. Klemens
,
W. Mansfield
,
H. Vaidya
,
J. Frackoviak
,
A. Timko
,
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 770 KB
Your tags:
english, 2000
13
Wide band gap fluoride dielectric crystals doped with trivalent rare earth ions as optical materials for 157 nm photolithography
E. Sarantopoulou
,
Z. Kollia
,
A.C. Cefalas
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 311 KB
Your tags:
english, 2000
14
248 nm Lithography for 180 nm contact holes
C. Romeo
,
A. Fiorino
,
P. Canestrari
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 1.37 MB
Your tags:
english, 2000
15
Sub-wavelength printing using multiple overlapping masks
S. Pau
,
O. Nalamasu
,
R. Cirelli
,
J. Frackoviak
,
A. Timko
,
G.P. Watson
,
F. Klemens
,
G. Timp
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 1.18 MB
Your tags:
english, 2000
16
AlSixNy as an embedded layer for attenuated phase-shifting mask in 193 nm and the utilization of a chemically amplified negative resist NEB-22 for maskmaking
Wen-an Loong
,
Cheng-ming Lin
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 342 KB
Your tags:
english, 2000
17
Influence of wafer chucking on focus margin for resolving fine patterns in optical lithography
A. Une
,
Y. Kai
,
M. Mochida
,
S. Matsui
,
F. Ohira
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 899 KB
Your tags:
english, 2000
18
A novel bottom antireflective coating working for both KrF and ArF excimer laser lithography
L.A. Wang
,
H.L. Chen
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 199 KB
Your tags:
english, 2000
19
Maximising the process window in sub-half-micron optical lithography
G. Arthur
,
B. Martin
,
C. Wallace
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 258 KB
Your tags:
english, 2000
20
Excimer lasers for 0.1 μm lithography and beyond
K. Vogler
,
U. Stamm
,
R. Pätzel
,
I. Tassy
,
I. Bragin
,
R. Osmanov
,
S. Govorkov
,
J. Kleinschmidt
,
T Schroeder
,
F. Voß
,
D. Basting
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 289 KB
Your tags:
english, 2000
21
Optical proximity correction by grey tone photolithography
Zheng Cui
,
Jinglei Du
,
Qizhong Huang
,
Jingqin Su
,
Yongkang Guo
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 1.34 MB
Your tags:
english, 2000
22
Process development for 30 nm poly gate patterning on 1.2 nm oxide
M. Heitzmann
,
M.E. Nier
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 1.63 MB
Your tags:
english, 2000
23
Fabrication of high density nanostructures gratings (>500Gbit/in2) used as molds for nanoimprint lithography
F. Carcenac
,
C. Vieu
,
A. Lebib
,
Y. Chen
,
L. Manin-Ferlazzo
,
H. Launois
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 1.45 MB
Your tags:
english, 2000
24
Nanoreplication in polymers using hot embossing and injection molding
H. Schift
,
C. David
,
M. Gabriel
,
J. Gobrecht
,
L.J. Heyderman
,
W. Kaiser
,
S. Köppel
,
L. Scandella
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 702 KB
Your tags:
english, 2000
25
Tri-layer systems for nanoimprint lithography with an improved process latitude
A. Lebib
,
Y. Chen
,
F. Carcenac
,
E. Cambril
,
L. Manin
,
L. Couraud
,
H. Launois
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 1.11 MB
Your tags:
english, 2000
26
Fabrication and characterization of vacuum nanoelectronic devices
A.A.G. Driskill-Smith
,
D.G. Hasko
,
H. Ahmed
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 707 KB
Your tags:
english, 2000
27
High resolution magnetic patterning using Focused Ion Beam irradiation
C. Vieu
,
J. Gierak
,
H. Launois
,
T. Aign
,
P. Meyer
,
J.P. Jamet
,
J. Ferré
,
C. Chappert
,
V. Mathet
,
H. Bernas
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 649 KB
Your tags:
english, 2000
28
Coulomb blockade in a silicon-on-sapphire nanowire
D. Dovinos
,
D.G. Hasko
,
Z. Helin
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 480 KB
Your tags:
english, 2000
29
Inverted modulation-doped n-type Si/Si0.77Ge0.23 heterostructures
R.B. Dunford
,
A. Ahmed
,
D.J. Paul
,
M. Pepper
,
A.C. Churchill
,
D.J. Robbins
,
A.J. Pidduck
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 528 KB
Your tags:
english, 2000
30
1/f-Noise of sub-100 nm-MOS-transistors fabricated by a special deposition and etchback technique
J.T. Horstmann
,
U. Hilleringmann
,
K. Goser
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 379 KB
Your tags:
english, 2000
31
Nanofabrication of quantum wires on (100) Si and SiGe by shifted-resist pattern and anisotropic wet etching
E. Giovine
,
E. Cianci
,
V. Foglietti
,
A. Notargiacomo
,
F. Evangelisti
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 769 KB
Your tags:
english, 2000
32
Combination of nanoimprint and scanning force lithography for local tailoring of sidewalls of nanometer devices
H. Schulz
,
A.S. Körbes
,
H.-C. Scheer
,
L.J. Balk
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 1.11 MB
Your tags:
english, 2000
33
Fabrication of metallic multilayer single electron tunneling devices using low-energy e-beam lithography
Th. Weimann
,
H. Scherer
,
P. Hinze
,
J. Niemeyer
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 1.22 MB
Your tags:
english, 2000
34
Parallel frequency readout of an array of mass-sensitive transducers for sensor applications
B.H. Kim
,
M. Maute
,
F.E. Prins
,
D.P. Kern
,
M. Croitoru
,
S. Raible
,
U. Weimar
,
W. Göpel
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 505 KB
Your tags:
english, 2000
35
Fabrication of nanostructures using a UV-based imprint technique
M. Bender
,
M. Otto
,
B. Hadam
,
B. Vratzov
,
B. Spangenberg
,
H. Kurz
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 888 KB
Your tags:
english, 2000
36
70 nm Features on 140 nm period using evanescent near field optical lithography
M.M. Alkaisi
,
R.J. Blaikie
,
S.J. McNab
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 1.18 MB
Your tags:
english, 2000
37
Temporal cross-section for carrier capture by self-assembled quantum dots
S. Raymond
,
S. Fafard
,
K. Hinzer
,
S. Charbonneau
,
J.L. Merz
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 299 KB
Your tags:
english, 2000
38
Self-organized quantum dot formation by ion sputtering
S. Facsko
,
T. Dekorsy
,
C. Trappe
,
H. Kurz
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 952 KB
Your tags:
english, 2000
39
A sub-micron photoluminescence system for nanostructure characterization
M. De Vittorio
,
C. Turco
,
R. Rinaldi
,
A. Melcarne
,
R. Cingolani
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 561 KB
Your tags:
english, 2000
40
Microcontact printing and pattern transfer with a tri-layer processing
Y. Chen
,
A. Lebib
,
F. Carcenac
,
H. Launois
,
G. Schmidt
,
M. Tormen
,
G. Müller
,
L.W. Molenkamp
,
M. Liebau
,
J. Huskens
,
S.N. Reinhoudl
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 953 KB
Your tags:
english, 2000
41
Imaging of Si nano-patterns embedded in SiO2 using scanning electron microscopy
M. Nagase
,
K. Kurihara
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 1.20 MB
Your tags:
english, 2000
42
Electron beam induced deposition of metallic tips and wires for microelectronics applications
I. Utke
,
B. Dwir
,
K. Leifer
,
F. Cicoira
,
P. Doppelt
,
P. Hoffmann
,
E. Kapon
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 1.69 MB
Your tags:
english, 2000
43
Fabrication of MOS-integrated metallic single electron memories
A. Pépin
,
C. Vieu
,
H. Launois
,
M. Rosmeulen
,
M. Van Rossum
,
H.O. Mueller
,
D. Williams
,
H. Mizuta
,
K. Nakazato
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 554 KB
Your tags:
english, 2000
44
Experimental evaluation of arrayed microcolumn lithography
L.P. Muray
,
K.Y. Lee
,
J.P. Spallas
,
M. Mankos
,
Y. Hsu
,
M.R. Gmur
,
H.S. Gross
,
C.B. Stebler
,
T.H.P. Chang
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 1.81 MB
Your tags:
english, 2000
45
An experimental setup to test the MAPPER electron lithography concept
B.J. Kampherbeek
,
M.J. Wieland
,
A. van Zuuk
,
P. Kruit
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 752 KB
Your tags:
english, 2000
46
PREVAIL — Evolution and properties of large area reduction projection electron optics
W. Stickel
,
G.O. Langner
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 351 KB
Your tags:
english, 2000
47
A study of multiple scattering effect with 10 kV e-beam system
Chan-Uk Jeon
,
Ji-Hyeon Choi
,
Byung-Gook Kim
,
Seong-Woon Choi
,
Hee-Sun Yoon
,
Jung-Min Sohn
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 589 KB
Your tags:
english, 2000
48
Electron-beam lithography of V-groove quantum wire devices
B. Dwir
,
I. Utke
,
D. Kaufman
,
E. Kapon
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 1.43 MB
Your tags:
english, 2000
49
Global space charge effect in SCALPEL
M. Mkrtchyan
,
E. Munro
,
J.A. Liddle
,
S.T. Stanton
,
W.K. Waskiewicz
,
R.C. Farrow
,
V. Katsap
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 376 KB
Your tags:
english, 2000
50
Marks for SCALPEL® tool optics optimization
R.C. Farrow
,
G.M. Gallatin
,
W.K. Waskiewicz
,
J.A. Liddle
,
I. Kizilyalli
,
A. Kornblit
,
C. Biddick
,
M. Blakey
,
F. Klemens
,
J. Felker
,
J. Kraus
,
M. Mkrtchyan
,
P.A. Orphanos
,
N. Layadi
,
S. Merchant
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 289 KB
Your tags:
english, 2000
51
Analysis of a SCALPEL™ multi-pass writing strategy
X. Zhu
,
E. Munro
,
J.A. Rouse
,
H. Liu
,
W.K. Waskiewicz
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 486 KB
Your tags:
english, 2000
52
A simple new method for the investigation of process latitude in E-beam lithography with positive resists
V.A. Kudryashov
,
P.D. Prewett
,
A.G. Michette
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 704 KB
Your tags:
english, 2000
53
Optimum energy for high resolution low voltage electron beam lithography — Monte Carlo simulations and experiments
M. Peuker
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 581 KB
Your tags:
english, 2000
54
Resist heating with different writing strategies for high-throughput maskmaking
Sergey Babin
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 1.20 MB
Your tags:
english, 2000
55
Comparison of PEC approaches for SCALPEL
Stuart Stanton
,
Anja Rosenbusch
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 505 KB
Your tags:
english, 2000
56
A study of electron forward scattering effects on the footwidth of T-gates fabricated using a bilayer of PMMA and UVIII
Y. Chen
,
D. Macintyre
,
S. Thoms
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 952 KB
Your tags:
english, 2000
57
Influence of electron acceleration voltage in the cell-projection lithography system
M. Kotera
,
K. Yamaguchi
,
M. Sakai
,
K. Naruse
,
T. Okagawa
,
K. Matsuoka
,
Y Kojima
,
M. Yamabe
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 296 KB
Your tags:
english, 2000
58
Thermal distortion predictions of a silicon wafer during exposure in a SCALPEL tool
S. Gianoulakis
,
J. Liddle
,
S. Stanton
,
G. Gallatin
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 344 KB
Your tags:
english, 2000
59
Improved pattern-placement accuracy in e-beam lithography via sparse-sample spatial-phase locking
J.T. Hastings
,
F. Zhang
,
J.G. Goodberlet
,
Henry Smith
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 793 KB
Your tags:
english, 2000
60
Etch characteristics of giant magnetoresistive materials
D.J. Resnick
,
S. Pendharkar
,
K. Kyler
,
G. Kerszykowski
,
S. Clemens
,
H. Tompkins
,
M. Durlam
,
S. Tehrani
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 872 KB
Your tags:
english, 2000
61
Quantum electron beam probe of sidewall dry-etch damage
M. Rahman
,
J.G. Williamson
,
K. Mathieson
,
G. Dick
,
M.J. Brown
,
S. Duffy
,
C.D.W. Wilkinson
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 498 KB
Your tags:
english, 2000
62
SiO2/Si selectivity in high density CHF3/CH4 plasmas: Role of the fluorocarbon layer
L. Rolland
,
M.C. Peignon
,
Ch. Cardinaud
,
G. Turban
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 351 KB
Your tags:
english, 2000
63
Resist removal process in dual damascene structure integrating Cu and SiLK® for 0.18 μm technology
D. Louis
,
C. Arvet
,
E. Lajoinie
,
C. Peyne
,
S. Lee
,
I. Berry
,
Q. Han
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 874 KB
Your tags:
english, 2000
64
Synthesis of silicide structures by high energy ion projection
U. Weidenmüller
,
J. Meijer
,
P. Baving
,
H. Röcken
,
H.H. Bukow
,
C. Rolfs
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 1.01 MB
Your tags:
english, 2000
65
Nanopatterning of organic and inorganic materials by holographic lithography and plasma etching
P. Visconti
,
C. Turco
,
R. Rinaldi
,
R. Cingolani
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 1.03 MB
Your tags:
english, 2000
66
Low temperature Electron Cyclotron Resonance plasma technique for low loss integrated optics
P.L. Pernas
,
E. Ruíz
,
M.J. Hernández
,
J. Garrido
,
B.J. García
,
J.L. Castan˜o
,
J.M. Requejo
,
J. Solís
,
R. Serna
,
C.N. Afonso
,
J. Piqueras
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 512 KB
Your tags:
english, 2000
67
Novel linear and crosslinking polymers for nanoimprinting with high etch resistance
K. Pfeiffer
,
M. Fink
,
G. Bleidiessel
,
G. Gruetzner
,
H. Schulz
,
H.-C. Scheer
,
T. Hoffmann
,
C.M. Sotomayor Torres
,
F. Gaboriau
,
Ch. Cardinaud
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 861 KB
Your tags:
english, 2000
68
Beam-assisted-etching technique for fabrication of single crystal diamond field emitter tip
J. Taniguchi
,
J. Yokoyama
,
M. Komuro
,
H. Hiroshima
,
I. Miyamoto
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 773 KB
Your tags:
english, 2000
69
Fabrication of nanostructures in GaN
B. Rong
,
R. Cheung
,
W. Gao
,
M. Kamp
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 895 KB
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70
A triphenylene derivative as a novel negative/positive tone resist of 10 nanometer resolution
T. Tada
,
T. Kanayama
,
A.P.G. Robinson
,
R.E. Palmer
,
M.T. Allen
,
J.A. Preece
,
K.D.M. Harris
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 601 KB
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71
Minimizing thick resist sidewall slope dependence on design geometry by optimizing bake conditions
H. Puchner
,
R. Castagnetti
,
W. Pyka
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 1.98 MB
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72
Optimization of an advanced positive tone DUV photoresist towards 150 nm and beyond
M. Ercken
,
M. Moelants
,
G. Vandenberghe
,
M. Goethals
,
K. Ronse
,
S. Masuda
,
W. Spiess
,
G. Pawlowski
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 1.90 MB
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73
Aqueous base developable epoxy resist for high sensitivity electron beam lithography
P. Argitis
,
N. Glezos
,
M. Vasilopoulou
,
I. Raptis
,
M. Hatzakis
,
J. Everett
,
G. Meneghini
,
A. Palumbo
,
M. Ardito
,
P. Hudek
,
I. Kostic
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 1.68 MB
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74
Bias printing of APSM resists for 180 nm contact holes
G. Teng
,
G. Prokopowicz
,
D. Kang
,
C. Xu
,
J. Thackeray
,
T. Duong
,
G. Orsula
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 915 KB
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75
Comparison of negative tone resists NEB22 and UVN30 in e-beam lithography
A.J. van Dodewaard
,
W.S.M.M. Ketelaars
,
R.F.M. Roes
,
J.A.J. Kwinten
,
F.C.M.J.M. van Delft
,
A.J. van Run
,
A.K. van Langen-Suurling
,
J. Romijn
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 596 KB
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76
157nm photodissociation of polyamides
A.C. Cefalas
,
E. Sarantopoulou
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 359 KB
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77
Highly sensitive positive surface modification resists
M. Shirai
,
M. Endo
,
M. Tsunooka
,
M. Endo
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 422 KB
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78
Development mechanism study by dissolution monitoring of positive methacrylate photoresists
I. Raptis
,
D. Velessiotis
,
M. Vasilopoulou
,
P. Argitis
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 404 KB
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79
Application of Calixarene for nanometer magnetic particle fabrication
P. Jedrasik
,
M. Hanson
,
B. Nilsson
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 1.50 MB
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80
Fabrication of a micromachined magnetic X/Y/Z scanner for parallel scanning probe applications
H. Rothuizen
,
U. Drechsler
,
G. Genolet
,
W. Häberle
,
M. Lutwyche
,
R. Stutz
,
R. Widmer
,
P. Vettiger
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 1.21 MB
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81
Micro-technology for anti- counterfeiting
R.A. Lee
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 1.46 MB
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82
Nanoimprint- and UV-lithography: Mix&Match process for fabrication of interdigitated nanobiosensors
L. Montelius
,
B. Heidari
,
M. Graczyk
,
I. Maximov
,
E-L. Sarwe
,
T.G.I. Ling
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 894 KB
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83
A novel insulation technique for smart power switching devices and very high voltage ICs above 10 kV
V. Mankowski
,
U. Hilleringmann
,
K. Schumacher
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 696 KB
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84
Coding gray-tone mask for refractive microlens fabrication
Jun Yao
,
Jingqin Su
,
Jinglei Du
,
Yixiao Zhang
,
Fuhua Gao
,
Feng Gao
,
Yongkang Guo
,
Zheng Cui
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 991 KB
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85
A new lithography technique using super-resolution near-field structure
M. Kuwahara
,
T. Nakano
,
J. Tominaga
,
M.B. Lee
,
N. Atoda
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 802 KB
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86
Three-dimensional microstructure elements fabricated by electron beam lithography and dry etching technique
R. Steingrüber
,
M. Ferstl
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 1.47 MB
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87
Micromachined silicon grisms: high resolution spectroscopy in the near infrared
E. Cianci
,
V. Foglietti
,
F. Vitali
,
D. Lorenzetti
,
A. Notargiacomo
,
E. Giovine
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 1.14 MB
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88
Microstructures etched in doped TMAH solutions
S. Brida
,
A. Faes
,
V. Guarnieri
,
F. Giacomozzi
,
B. Margesin
,
M. Paranjape
,
G.U. Pignatel
,
M. Zen
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 961 KB
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89
Submicron semiconductor structure for microwave detection
S. Asˇmontas
,
J. Gradauskas
,
A. Sužiedėlis
,
G. Valusˇis
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 577 KB
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90
Replication of 3D-micro- and nanostructures using different UV-curable polymers
St. Rudschuck
,
D. Hirsch
,
K. Zimmer
,
K. Otte
,
A. Braun
,
R. Mehnert
,
F. Bigl
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 265 KB
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91
A micromachined Xenon flow regulator for space applications
A. Diligenti
,
A. Nannini
,
F. Pieri
,
M. Piotto
,
G. Noci
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 412 KB
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92
A silicon microfabricated electrostatic transducer: 1 MHz transmission in air and in water
G. Caliano
,
V. Foglietti
,
E. Cianci
,
M. Pappalardo
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 584 KB
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93
Flexible, reliable and simple fabrication of integrated spot size converters with shifting mask technique
R. Steingrüber
,
D. Trommer
,
R. Kaiser
,
K. Pfeiffer
,
I. Tiedke
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 569 KB
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94
High-value MOS capacitor arrays in ultradeep trenches in silicon
F. Roozeboom
,
R. Elfrink
,
J. Verhoeven
,
J. van den Meerakher
,
F. Holthuysen
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 1.61 MB
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95
Using X-ray Lithography to make sub 100 nm MMICs
Robert (Bob) Selzer
,
John Heaton
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 1.88 MB
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96
Fine pattern fabrication of α-type Ta on a membrane for X-ray mask absorber using ECR ion stream etching
T. Tsuchizawa
,
C. Takahashi
,
M. Shimada
,
S. Uchiyama
,
T. Ono
,
M. Oda
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 852 KB
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97
3D microstructures fabricated by partially opaque X-ray lithography masks
S. Cabrini
,
M. Gentili
,
E. Di Fabrizio
,
A. Gerardino
,
A. Nottola
,
Q. Leonard
,
L. Mastrogiacomo
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 1.23 MB
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98
Comparison of experimental and Monte Carlo results of stochastic Coulomb interaction in projection beam lithography
P.W.H. de Jager
,
B. Mertens
,
E. Munro
,
E. Cekan
,
G. Lammer
,
H. Vonach
,
H. Buschbeck
,
M. Zeininger
,
C. Horner
,
H. Löschner
,
G. Stengl
,
A.J. Bleeker
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 878 KB
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99
Electroabsorption in a GaAs n-i-p-i structure with selective contacts fabricated by Focused Ion Molecular Beam Epitaxy
S. Vijendran
,
G.A.C. Jones
,
H.E. Beere
,
A.J. Shields
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 562 KB
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100
Application of scanning probe microscopy for the determination of the structural accuracy of high aspect ratio microstructures
S. Achenbach
,
J. Mohr
,
F.J. Pantenburg
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 677 KB
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101
Multilayer integrated-circuit imaging with contrast enhancement in a large-area, high-resolution electron-beam system
D.J. Weaver
,
J.R.A. Cleaver
,
L. Avery
,
H. Ahmed
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 1.84 MB
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102
High resolution and high sensitivity near-field optical microscope
J.M. Freyland
,
R. Eckert
,
H. Heinzelmann
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 662 KB
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103
A proposal of high power EUV lithography illumination system using synchrotron radiation
Y. Gomei
,
ASET Association of Super-Advanced Electronics Technologies
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 296 KB
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104
A liquid-xenon-jet laser-plasma x-ray and EUV source
B.A.M. Hansson
,
L. Rymell
,
M. Berglund
,
H.M. Hertz
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 275 KB
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105
Theoretical estimation of absorption coefficients of various polymers at 13 nm
Nobuyuki N. Matsuzawa
,
Hiroaki Oizumi
,
Shigeyasu Mori
,
Shigeo Irie
,
Ei Yano
,
Shinji Okazaki
,
Akihiko Ishitani
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 309 KB
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106
Comparison of Extreme Ultraviolet Sources for Lithography Applications
V.Y. Banine
,
J.P.H. Benschop
,
H.G.C. Werij
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 362 KB
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107
Nanostructuring of zone plates for helium atom beam focusing
S. Rehbein
,
R.B. Doak
,
R.E. Grisenti
,
G. Schmahl
,
J.P. Toennies
,
Ch. Wöll
Journal:
Microelectronic Engineering
Year:
2000
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english
File:
PDF, 1.09 MB
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108
Author index volume 53
Journal:
Microelectronic Engineering
Year:
2000
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english
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109
Editorial Board
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
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PDF, 57 KB
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110
System-On-Chip: A way around lithography limitations
L. Baldi
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
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111
Photon confinement effects — from physics to applications
A. Forchel
,
M. Kamp
,
T. Happ
,
J.P. Reithmaier
,
M. Bayer
,
J. Koeth
,
R. Dietrich
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 845 KB
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112
Advanced mesoscopic device concepts and technology
Hideki Hasegawa
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 1.21 MB
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113
Soft x-rays for deep sub-100 nm lithography, with and without masks
Henry I. Smith
,
D.J.D. Carter
,
M. Meinhold
,
E.E. Moon
,
M.H. Lim
,
J. Ferrera
,
M. Walsh
,
D. Gil
,
R. Menon
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 1.59 MB
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114
Determining mask effects in low k1 lithography
Martin McCallum
,
Ron Gordon
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 418 KB
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115
Absorbance and outgasing of photoresist polymeric materials for UV lithography below 193 nm including 157 nm lithography
A.C. Cefalas
,
E. Sarantopoulou
,
E. Gogolides
,
P. Argitis
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 288 KB
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116
High order lens aberration monitor
J. Preuninger
,
S. Bukofsky
,
G. Kunkel
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 900 KB
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117
Fabrication of Single Electron Devices by hybrid (E-beam/DUV) lithography
L. Palun
,
S. Tedesco
,
M. Heitzman
,
F. Martin
,
D. Fraboulet
,
B. Dal'zotto
,
M.E. Nier
,
P. Mur
,
T. Charvolin
,
D. Mariolle
,
F. Tardif
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 1.71 MB
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118
Multifunctional AFM/SNOM cantilever probes: Fabrication and measurements
M. Stopka
,
D. Drews
,
K. Mayr
,
M. Lacher
,
W. Ehrfeld
,
T. Kalkbrenner
,
M. Graf
,
V. Sandoghdar
,
J. Mlynek
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 898 KB
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119
Direct electron beam writing of nanostructures using passivated gold clusters
T.R. Bedson
,
P.D. Nellist
,
R.E. Palmer
,
J.P. Wilcoxon
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 1.18 MB
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120
Capacitively- and resistively-coupled single-electron transistor
F. Wakaya
,
S. Mandai
,
S. Nakamichi
,
S. Iwabuchi
,
K. Gamo
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 780 KB
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121
Si/Si1−xGex heterostructure field effect transistors fabricated using a low thermal budget CMOS process
R.B. Dunford
,
D.J. Paul
,
M. Pepper
,
B. Coonan
,
N. Griffin
,
G. Redmond
,
G.M. Crean
,
B. Holländer
,
S. Mantl
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 863 KB
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122
Experimental and numerical investigations of photomask substrate heating due to electron beam patterning
B. Shamoun
,
D. Trost
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 294 KB
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123
Determination of proximity effect parameters and the shape bias parameter in electron beam lithography
Eunsung Seo
,
Bo Kyung Choi
,
Ohyun Kim
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 593 KB
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124
Study of resist surface roughness in EB lithography
A. Yoshida
,
Y. Kojima
,
K. Matsuoka
,
Y. Tomo
,
I. Shimizu
,
M. Yamabe
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 1.12 MB
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125
Application of neural network to enhancing accuracy of E-beam proximity effect correction
S.-Y. Lee
,
J. Laddha
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 325 KB
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126
Fabrication of semi-continuous profile Diffractive Optical Elements for beam shaping by Electron Beam Lithography
A. Nottola
,
A. Gerardino
,
M. Gentili
,
E. Di Fabrizio
,
S. Cabrini
,
P. Melpignano
,
G. Rotaris
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 589 KB
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127
Performance of new E-beam lithography system JBX-9300FS
H. Takemura
,
H. Ohki
,
H. Nakazawa
,
Y. Nakagawa
,
M. Isobe
,
Y. Ochiai
,
T. Ogura
,
M. Narihiro
,
T. Mogami
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 916 KB
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128
SiO2 and Si etching in fluorocarbon plasmas: Coupling of a surface model with a profile evolution simulator
G. Kokkoris
,
E. Gogolides
,
A.G. Boudouvis
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 582 KB
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129
Fabrication of sub-10nm Si-tip array coated with Si3N4 thin film for potential NSOM and liquid metal ion source applications
M.Y. Jung
,
D.W. Kim
,
S.S. Choi
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 1.69 MB
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130
Resistless patterning of sub-micron structures by evaporation through nanostencils
J. Brugger
,
J.W. Berenschot
,
S. Kuiper
,
W. Nijdam
,
B. Otter
,
M. Elwenspoek
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 916 KB
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131
Monte Carlo study of high performance resists for SCALPEL nanolithography
L.E. Ocola
,
W-Y. Li
,
R.J. Kasica
,
M.I. Blakey
,
P.A. Orphanos
,
W.K. Waskiewicz
,
A.E. Novembre
,
M. Sato
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 912 KB
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132
Overview of the STORM program application to 193nm singe layer resists
E. Croffie
,
M. Cheng
,
A. Neureuther
,
R. Cirelli
,
F. Houlihan
,
J. Sweeney
,
P. Watson
,
O. Nalamasu
,
I. Rushkin
,
O. Dimov
,
A. Gabor
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 784 KB
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133
Three-dimensional resist development simulation — Benchmarks and integration with lithography
W. Pyka
,
H. Kirchauer
,
S. Selberherr
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 482 KB
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134
Characterisation of the ultrasonic development process in UVIII resist
Shazia Yasin
,
A. Mumtaz
,
D.G. Hasko
,
F. Carecenac
,
H. Ahmed
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 794 KB
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135
Acid diffusion analysis in the chemically amplified CARL resist
E. Richter
,
S. Hien
,
M. Sebald
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 390 KB
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136
High sensitive negative silylation process for 193nm lithography
M. Endo
,
I. Satou
,
H. Watanabe
,
H. Morimoto
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 842 KB
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137
Use of SU-8 photoresist for very high aspect ratio x-ray lithography
A.L. Bogdanov
,
S.S. Peredkov
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 786 KB
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138
High density fluorocarbon plasma etching of new resists suitable for nano-imprint lithography
F. Gaboriau
,
M.C. Peignon
,
A. Barreau
,
G. Turban
,
Ch. Cardinaud
,
K. Pfeiffer
,
G. Bleidießel
,
G. Grützner
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 667 KB
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139
Fabrication of NMR — Microsensors for nanoliter sample volumes
J. Dechow
,
A. Forchel
,
T. Lanz
,
A. Haase
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 585 KB
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140
A micromachined bistable 1×2 switch for optical fibers
F. Pieri
,
M. Piotto
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 917 KB
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141
A structure definition technique for 25 nm lines of silicon and related materials
U. Hilleringmann
,
T. Vieregge
,
J.T. Horstmann
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 973 KB
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142
Overlay performance of SR lithography in 64M DRAM layers
H. Sumitani
,
M. Suita
,
T. Hifumi
,
H. Watanabe
,
H. Yabe
,
K. Itoga
,
S. Aya
,
K. Marumoto
,
Y. Matsui
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 583 KB
Your tags:
english, 2000
143
Dry etch improvements in the SOI wafer flow process for IPL stencil mask fabrication
F. Letzkus
,
J. Butschke
,
B. Höfflinger
,
M. Irmscher
,
C. Reuter
,
R. Springer
,
A. Ehrmann
,
J. Mathuni
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 1.85 MB
Your tags:
english, 2000
144
Temperature and energy spread investigations of alloy LMIS
L. Bischoff
,
J. Teichert
,
S. Hausmann
,
T. Ganetsos
,
G.L.R. Mair
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 270 KB
Your tags:
english, 2000
145
Modeling pattern transfer in ion-beam lithography masks
G. Frisque
,
R. Tejeda
,
R. Engelstad
,
E. Lovell
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 1.35 MB
Your tags:
english, 2000
146
The birefringence and polarization effects of amorphous Ge and Si gratings by focused-ion-beam
Kyung Shin
,
Jin-Woo Kim
,
Jung-Il Park
,
Young-Jong Lee
,
Hyun-Yong Lee
,
Hong-Bay Chung
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 673 KB
Your tags:
english, 2000
147
X-ray nano-diffraction: 100 nm resolution obtained in a novel imaging technique for strain measurement at buried interfaces
S. Lagomarsino
,
S. Di Fonzo
,
W. Jark
,
C. Giannini
,
L. De Caro
,
A. Cedola
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 841 KB
Your tags:
english, 2000
148
Development of a secondary-electron detection system for high-speed high-sensitivity inspection SEM imaging
A. Takafuji
,
M. Nozoe
,
H. Shinada
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 557 KB
Your tags:
english, 2000
149
Mitigation of surface contamination from resist outgassing in EUV lithography
B.M. Mertens
,
B. van der Zwan
,
P.W.H. de Jager
,
M. Leenders
,
H.G.C. Werij
,
J.P.H. Benschop
,
A.J.J. van Dijsseldonk
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 318 KB
Your tags:
english, 2000
150
Fabrication of stair-case profiles with high aspect ratios for blazed diffractive optical elements
C. David
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 1.27 MB
Your tags:
english, 2000
151
Prediction of resolution using wet-develop type single layer and dry-development process for EUV lithography
Shigeyasu Mori
,
Shigeru Shirayone
,
Shigeo Irie
,
Nobuyuki Matsuzawa
,
Hiroaki Oizumi
,
Ei Yano
,
Shinji Okazaki
,
Atsushi Miyafuji
,
Takeo Watanabe
,
Hiroo Kinoshita
,
Tetsuya Oshio
,
Katsumi Sugisaki
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 502 KB
Your tags:
english, 2000
152
Ion projection lithography for resistless patterning of thin magnetic films
W.H. Bruenger
,
M. Torkler
,
C. Dzionk
,
B.D. Terris
,
L. Folks
,
D. Weller
,
H. Rothuizen
,
P. Vettiger
,
G. Stangl
,
W. Fallmann
Journal:
Microelectronic Engineering
Year:
2000
Language:
english
File:
PDF, 466 KB
Your tags:
english, 2000
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