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SiO2/Si selectivity in high density CHF3/CH4 plasmas: Role of the fluorocarbon layer
L. Rolland, M.C. Peignon, Ch. Cardinaud, G. TurbanVolume:
53
Year:
2000
Language:
english
Pages:
5
DOI:
10.1016/s0167-9317(00)00337-3
File:
PDF, 351 KB
english, 2000