Bias printing of APSM resists for 180 nm contact holes

Bias printing of APSM resists for 180 nm contact holes

G. Teng, G. Prokopowicz, D. Kang, C. Xu, J. Thackeray, T. Duong, G. Orsula
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Volume:
53
Year:
2000
Language:
english
Pages:
4
DOI:
10.1016/s0167-9317(00)00355-5
File:
PDF, 915 KB
english, 2000
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